The nucleation mechanism of MoS2 on Au(111) surface

被引:0
作者
Shao, Peng [1 ]
Wang, Chen-Yu [1 ]
Xia, Rong Rong [1 ]
Zhang, Xiao-Chun [1 ]
Liu, Ling-Yue [2 ]
Zhao, Ya-Ru [3 ]
机构
[1] Shaanxi Univ Sci & Technol, Sch Phys & Informat Sci, Dept Phys, Xian 710021, Peoples R China
[2] Shaanxi Univ Sci & Technol, Sch Mat Sci & Engn, Xian 710021, Peoples R China
[3] Baoji Univ Arts & Sci, Sch Elect & Elect Engn, Baoji, Peoples R China
关键词
Au(111) surface; MoS2; Growth mechanism; Chemical vapor deposition; SINGLE-LAYER MOS2; CHEMICAL-VAPOR-DEPOSITION; TOTAL-ENERGY CALCULATIONS; MOLECULAR-DYNAMICS; GROWTH; NANOSHEETS;
D O I
10.1016/j.mtcomm.2024.109634
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Controllable preparation of two-dimensional MoS 2 single crystal thin films is the key to its development and application. Chemical vapor deposition (CVD) is considered one of the most promising methods for large-scale production of 2D MoS 2 films. However, at present, the single crystal MoS 2 films prepared by CVD have defects and insufficient sizes. The reason may be that the CVD growth mechanism of MoS 2 is still unclear. In this paper, density functional theory (DFT) and molecular dynamics (MD) simulations are used to systematically explore the nucleation mechanism of MoS 2 grown on Au (111) surface with molybdenum powder and H 2 S as precursors. In our theoretical study, some key links of MoS 2 nucleation have been clearly displayed, such as deposition of molybdenum, dehydrogenation of H 2 S, lifting of Mo atoms and so on. This study provides a deep understanding of the nucleation of MoS 2 during CVD growth and theoretical basis for the synthesis of various TMDs.
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页数:7
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