Properties Enhancement of Cu2O/TiO2 Heterostructure Film Using Two-step Hydrothermal and Potentiostatic Deposition Method

Two-steps hydrothermal were demonstrated to create a high efficiently interfacial layer of TiO 2 thin film. The first hydrothermal was conducted to synthesize a well -aligned and compact structure of TiO 2 nanorods on FTO substrate. Etching treatment in an acidic medium of hydrochloric acid (HCl) as a second hydrothermal favors increasing the surface area prior to any deposition to be a heterostructure film. The morphology of nanorods changed while the electrical resistivity decreased, demonstrating that the etching treatment had a substantial effect on the TiO2 thin film properties. Cyclic voltammetry (CV) was conducted prior deposition. The electrodeposition of Cu2O on the TiO2 thin film was fabricated by using copper acetate -based solution with pH value of 12.0 at bath temperature of 60 degrees C. The finding revealed that the pyramidal structure of Cu2O film was deposited uniformly, which is believed that the properties of TiO2 interfacial layer were excellently improved.