Ultralow reflectance induced by nanowire array on polycrystalline diamond

被引:0
|
作者
Lu, Yunxiang [1 ,2 ]
Qiu, Mengting [2 ]
Wang, Bo [3 ]
Yi, Jian [2 ]
Song, Hui [2 ]
Nishimura, Kazhihito [2 ]
Jiang, Nan [2 ]
Zhou, Ping [1 ]
机构
[1] Dalian Univ Technol, Dept Mech Engn, State Key Lab High Performance Precis Mfg, Dalian 116024, Peoples R China
[2] Chinese Acad Sci, Ningbo Inst Mat Technol & Engn, Key Lab Marine Mat & Related Technol, Ningbo 315201, Peoples R China
[3] Saarland Univ, Dept Mat Sci & Engn, D-66123 Saarbrucken, Germany
基金
中国国家自然科学基金;
关键词
Polycrystalline diamond; Nanowire array; Ultralow reflectance; Inductively coupled plasma etching;
D O I
10.1016/j.tsf.2024.140455
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nanostructured blackbodies have a wide application in the fields of light control, energy harvesting and desalination, benefiting from their efficient absorption and radiation on rays with specific wavelength. However, present blackbody materials often suffer deficiencies in stability and mechanical strength. Diamond is an ideal material for blackbody application owing to its excellent stability and corrosion resistance. In this paper, a highdensity nanowire array was fabricated on polycrystalline diamond substrate by two-step etching, including hydrogen/oxygen plasma etching and inductively coupled plasma etching. The diamond nanowires have a length of several micrometers and a diameter of about 52 nm. The reflectance spectra verified that the diamond nanowire array has an ultralow average reflectance of 0.7 % within the 500-2000 nm range, demonstrating a reflection reduction by 2530 % compared to the original polycrystalline diamond. The lowest reflectance of 0.5 % was achieved at a wavelength of 1796 nm.
引用
收藏
页数:6
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