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Exploring the electronic and superior piezoelectric properties of two-dimensional PH-SiX materials for high-performance silicon-based devices
被引:0
|作者:
Yang, Lei
[1
]
Gao, Jin
[1
]
Chen, Rongrong
[1
]
Jia, Chenglong
[1
]
Xue, Desheng
[1
]
Tao, Kun
[1
]
机构:
[1] Lanzhou Univ, Sch Phys Sci & Technol, Lanzhou, Peoples R China
基金:
中国国家自然科学基金;
关键词:
NITRIDE;
MOS2;
D O I:
10.1039/d4tc02881c
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
The search for advanced two-dimensional materials with exceptional piezoelectric properties has led to the investigation of PH-SiX (X = Cd, Zn, Bi, Ga, and Al) semiconductors, which are compatible with the existing silicon technology. Through first-principles calculations, we reveal that these materials possess superior piezoelectric coefficients, owing to the lack of inversion symmetry and out-of-plane mirror symmetry in PH-SiX. Notably, PH-SiZn exhibits a d11 value of 63.148 pm V-1, which is substantially higher than that of the well-known 2H-MoS2 by a factor of 17. By comparing d31 of PH-SiX, we conclude that the size of d31 is negatively related to the electronegativity difference between Si and X atoms. Furthermore, the strategic application of compressive strain leads to a significant enhancement of piezoelectricity, with PH-SiAl showing a significant improvement of 369.2% in piezoelectricity at 4% compressive strain. The combination of their dynamic, thermodynamic, and mechanical stabilities, along with tunable bandgaps ranging from 0.11 eV to 1.07 eV, positions PH-SiX as compelling materials for the development of next-generation silicon-based devices. PH-SiZn exhibits a d11 value of 63.148 pm V-1, which is higher than that of 2H-MoS2 by a factor of 17. The compressive strain leads to an enhancement of piezoelectricity, with PH-SiAl in an improvement of 369.2% in piezoelectricity at 4% strain.
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页码:16583 / 16593
页数:11
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