A general approach for the alpha-arylation of heteroarenes with nitroarenes via denitrative coupling is reported for the first time. Various heteroarenes, including derivatives of furan, benzofuran, pyrrole, indole, thiophene, and benzothiophene, can be arylated at the alpha-position in moderate to good yields. Mechanistic studies demonstrate that the reaction proceeds via a CMD pathway, with C-H bond activation as the rate-determining step. Furthermore, the scalability and applicability in the synthesis of a drug molecule exemplify the utility of this protocol.
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Univ Bari Aldo Moro, Dipartimento Chim, Via Edoardo Orabona 4, I-70125 Bari, ItalyUniv Bari Aldo Moro, Dipartimento Chim, Via Edoardo Orabona 4, I-70125 Bari, Italy
Capozzi, Maria Annunziata M.
Farinola, Gianluca M.
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Univ Bari Aldo Moro, Dipartimento Chim, Via Edoardo Orabona 4, I-70125 Bari, ItalyUniv Bari Aldo Moro, Dipartimento Chim, Via Edoardo Orabona 4, I-70125 Bari, Italy
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Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Asahara, Kitty K.
Okita, Toshimasa
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Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Okita, Toshimasa
Saito, Ami N.
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Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Saito, Ami N.
Muto, Kei
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Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Muto, Kei
Nakao, Yoshiaki
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Kyoto Univ, Grad Sch Engn, Dept Mat Chem, Kyoto 6158510, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
机构:
Univ Fed Rio de Janeiro, Fac Farm, LASSBio, BR-21944971 Rio De Janeiro, Brazil
Univ Fed Rio de Janeiro, Programa Posgrad Quim, Inst Chem, BR-21944971 Rio De Janeiro, BrazilUniv Fed Rio de Janeiro, Fac Farm, LASSBio, BR-21944971 Rio De Janeiro, Brazil
de Sa Alves, Fernando Rodrigues
Barreiro, Eliezer J.
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Univ Fed Rio de Janeiro, Fac Farm, LASSBio, BR-21944971 Rio De Janeiro, Brazil
Univ Fed Rio de Janeiro, Programa Posgrad Quim, Inst Chem, BR-21944971 Rio De Janeiro, BrazilUniv Fed Rio de Janeiro, Fac Farm, LASSBio, BR-21944971 Rio De Janeiro, Brazil
Barreiro, Eliezer J.
Manssour Fraga, Carlos Alberto
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Univ Fed Rio de Janeiro, Fac Farm, LASSBio, BR-21944971 Rio De Janeiro, Brazil
Univ Fed Rio de Janeiro, Programa Posgrad Quim, Inst Chem, BR-21944971 Rio De Janeiro, BrazilUniv Fed Rio de Janeiro, Fac Farm, LASSBio, BR-21944971 Rio De Janeiro, Brazil
机构:
Univ Bari Aldo Moro, Dipartimento Chim, Via Edoardo Orabona 4, I-70125 Bari, ItalyUniv Bari Aldo Moro, Dipartimento Chim, Via Edoardo Orabona 4, I-70125 Bari, Italy
Capozzi, Maria Annunziata M.
Farinola, Gianluca M.
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h-index: 0
机构:
Univ Bari Aldo Moro, Dipartimento Chim, Via Edoardo Orabona 4, I-70125 Bari, ItalyUniv Bari Aldo Moro, Dipartimento Chim, Via Edoardo Orabona 4, I-70125 Bari, Italy
机构:
Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Asahara, Kitty K.
Okita, Toshimasa
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机构:
Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Okita, Toshimasa
Saito, Ami N.
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机构:
Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Saito, Ami N.
Muto, Kei
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h-index: 0
机构:
Waseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
Muto, Kei
Nakao, Yoshiaki
论文数: 0引用数: 0
h-index: 0
机构:
Kyoto Univ, Grad Sch Engn, Dept Mat Chem, Kyoto 6158510, JapanWaseda Univ, Dept Appl Chem, Shinjuku Ku, 3-4-1 Ohkubo, Tokyo 1698555, Japan
机构:
Univ Fed Rio de Janeiro, Fac Farm, LASSBio, BR-21944971 Rio De Janeiro, Brazil
Univ Fed Rio de Janeiro, Programa Posgrad Quim, Inst Chem, BR-21944971 Rio De Janeiro, BrazilUniv Fed Rio de Janeiro, Fac Farm, LASSBio, BR-21944971 Rio De Janeiro, Brazil
de Sa Alves, Fernando Rodrigues
Barreiro, Eliezer J.
论文数: 0引用数: 0
h-index: 0
机构:
Univ Fed Rio de Janeiro, Fac Farm, LASSBio, BR-21944971 Rio De Janeiro, Brazil
Univ Fed Rio de Janeiro, Programa Posgrad Quim, Inst Chem, BR-21944971 Rio De Janeiro, BrazilUniv Fed Rio de Janeiro, Fac Farm, LASSBio, BR-21944971 Rio De Janeiro, Brazil
Barreiro, Eliezer J.
Manssour Fraga, Carlos Alberto
论文数: 0引用数: 0
h-index: 0
机构:
Univ Fed Rio de Janeiro, Fac Farm, LASSBio, BR-21944971 Rio De Janeiro, Brazil
Univ Fed Rio de Janeiro, Programa Posgrad Quim, Inst Chem, BR-21944971 Rio De Janeiro, BrazilUniv Fed Rio de Janeiro, Fac Farm, LASSBio, BR-21944971 Rio De Janeiro, Brazil