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Copper metallization of carbon fiber-reinforced epoxy polymer composites by surface activation and electrodeposition
被引:0
|作者:
Basheer, Bashida
[1
]
Akhil, M. G.
[1
,2
]
Rajan, T. P. D.
[1
,2
]
Agarwal, Pankaj
[3
]
Saikrishna, V. Vijay
[3
]
机构:
[1] CSIR Natl Inst Interdisciplinary Sci & Technol, Mat Sci & Technol Div, Thiruvananthapuram 695019, Kerala, India
[2] Acad Sci & Innovat Res AcSIR, Ghaziabad 201002, India
[3] Indian Space Res Org ISRO, Vikram Sarabhai Space Ctr VSSC, Thiruvananthapuram 695013, India
关键词:
Epoxy-carbon fiber composite;
Electrodeposition;
Surface activation;
Sn/Ag activation;
Electrical conductivity;
Adhesion;
COLD-SPRAY;
DEPOSITION;
COATINGS;
CORROSION;
ADHESION;
MECHANISMS;
STRENGTH;
HARDNESS;
GLASS;
D O I:
10.1016/j.surfcoat.2024.131016
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
The application of polymer metallization in lightweight and high-strength materials for the sporting goods, automotive, aerospace and construction sectors has attracted considerable attention. The present study aims to deposit a thin, uniform copper (Cu) layer on an epoxy-carbon fiber (epoxy-Cf) composite material for lightweight, high-frequency radio reflector applications (Ka-Band and higher frequencies) required in space missions. In this work, a surface-activated electroplating technique in which the surface of the substrate is activated with a Sn/Ag system, followed by conventional electroplating is studied. Surface activation deposits layers of conducting metal ions on the surface of the epoxy-Cf composite, which significantly improves the electrical conductivity of the composite surface. The subsequent electrodeposition takes place from a CuSO4 solution with a pH value of 4 at three different current density values of 0.05 A/dm2, 0.5 A/dm2 and 1 A/dm2. The presence and abundance of metallic Cu over epoxy-Cf composite were confirmed by X-ray diffraction and X-ray photoelectron spectroscopy. The morphology and elemental composition of the coating were characterized by scanning electron microscopy equipped with energy dispersive spectroscopy. With current density and coating thickness, morphology of the deposit changed from cauliflower-like to spherical along with grain refinement. Microhardness test shows a hardness of 330 HV and the pull-off adhesion test gave a bond strength of 1.69 MPa for 27.56 mu m thick copper deposit. A major challenge encountered during the deposition of Cu is the oxidation of the metal followed by immediate tarnishing. This issue has been effectively addressed by employing benzotriazole solution as a protective agent.
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页数:14
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