Rejection of PFAS and priority co-contaminants in semiconductor fabrication wastewater by nanofiltration membranes

Use of high-pressure membranes is an effective means for removal of per-and polyfluoroalkyl substances (PFAS) that is less sensitive than adsorption processes to variable water quality and specific PFAS structure. This study evaluated the use of nanofiltration (NF) membranes for the removal of PFAS and industry relevant co- contaminants in semiconductor fabrication (fab) wastewater. Initial experiments using a flat sheet filtration cell determined that the NF90 (tight NF) membrane provided superior performance compared to the NF270 (loose NF) membrane, with NF90 rejection values exceeding 97 % for all PFAS evaluated, including the ultra- short trifluoromethane sulfonic acid (TFMS). Cationic fab co-contaminants diaryliodonium (DIA), triphenylsulfonium (TPS), and tetramethylammonium hydroxide (TMAH) were not as highly rejected as anionic PFAS likely due to electrostatic effects. A spiral wound NF90 module was then used in a pilot system to treat a lab solution containing PFAS and co-contaminants and fab wastewater effluent. Treatment of the fab wastewater, containing high concentrations of perfluorocarboxylic acids (PFCAs), including trifluoroacetic acid (TFA: 96,413 ng/L), perfluoropropanoic acid (PFPrA: 11,796 ng/L), and perfluorobutanoic acid (PFBA: 504 ng/L), resulted in >= 92 % rejection of all PFAS while achieving 90 % water recovery in a semi-batch configuration. These findings demonstrate nanofiltration as a promising technology option for incorporation in treatment trains targeting PFAS removal from wastewater matrices.