共 47 条
[1]
Alarcón-Salazar J, 2016, CHEMICAL VAPOR DEPOSITION - RECENT ADVANCES AND APPLICATIONS IN OPTICAL, SOLAR CELLS AND SOLID STATE DEVICES, P159, DOI 10.5772/63012
[2]
Fluorinated-chlorinated SiO2 films prepared at low temperature by remote plasma-enhanced chemical-vapor deposition using mixtures of SiF4 and SiCl4
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
2001, 19 (02)
:507-514
[3]
Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF4/O2 and Ar plasmas
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
2022, 40 (05)
[4]
Role of NO in highly selective SiN/SiO2 and SiN/Si etching with NF3/O2 remote plasma: Experiment and simulation
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
2017, 35 (06)