Relationship between Tg of Polyimide Resin and Resist Sensitivity in Three-Component Chemically Amplified Polyimide Resist

被引：0
|
作者：
Madokoro, Daiki [1 ]
Takashima, Katsuaki [1 ]
Tanaka, Susumu [2 ]
Yamaoka, Kohei [2 ]
Yuba, Tomoyuki [2 ]
Horibe, Hideo [1 ]
机构：
[1] Osaka Metropolitan Univ, Grad Sch Engn, Dept Chem & Bioengn, 3-3-138 Sumiyoshi Ku, Osaka 5588585, Japan
[2] Toray Industries Ltd, Elect & Imaging Mat Res Labs, 3-1-2 Sonomiya, Otsu, Shiga 5200842, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2024年 / 37卷 / 05期
关键词：
Polyimide resist; Chemically amplified resist; Deprotection reaction; Acid diffusion; DISSOLUTION; INHIBITOR; PRECURSOR; ACID; DYES;
D O I：
暂无
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
In this paper, we have explained a relationship between the resist sensitivity and Tg of the base polymers in three-component chemically amplified polyimide resists. Three-component chemically amplified resists consist of a base polymer, a photoacid generator (PAG), and a dissolution inhibitor that is deprotected by acid. Three polyimide resins with different Tg or the novolac resin were used as the base polymer. The polyimide resist had lower resist sensitivity than the novolac resist. The UV light absorption of the base polymers hardly inhibited the photoreaction of PAG. The higher the Tg of the base polymer, the more the deprotection reaction and acid diffusion in the resist films were promoted. From these results, a negative correlation between the Tg of the base polymer and the resist sensitivity was discovered.
引用
收藏
页码：517 / 522
页数：6
相关论文
共 50 条
  • [41] AQUEOUS BASE DEVELOPABLE DEEP-UV RESIST BASED ON CHEMICALLY AMPLIFIED CROSS-LINKING OF PHENOLIC RESIN
    SCHAEDELI, U
    HOLZWARTH, H
    MUENZEL, N
    SCHULZ, R
    POLYMER ENGINEERING AND SCIENCE, 1992, 32 (20): : 1523 - 1529
  • [42] Relationships between Stochastic Phenomena and Optical Contrast in Chemically Amplified Resist Process of Extreme Ultraviolet Lithography
    Kozawa, Takahiro
    Santillan, Julius Joseph
    Itani, Toshiro
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2014, 27 (01) : 11 - 19
  • [43] Difference between initial distributions of proton and counter anion in chemically amplified electron-beam resist
    Kozawa, Takahiro
    Yamamoto, Hiroki
    Saeki, Akinori
    Tagawa, Seiichi
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXIII, PTS 1 AND 2, 2006, 6153 : U478 - U486
  • [44] Electrical and mechanical property study on three-component polyimide nanocomposite films with titanium dioxide and montmorillonite
    Liu, Xiaoxu
    Yin, Jinghua
    Kong, Yunan
    Chen, Minghua
    Feng, Yu
    Yan, Kai
    Li, Xiuhong
    Su, Bo
    Lei, Qingquan
    THIN SOLID FILMS, 2013, 544 : 352 - 356
  • [45] New non-chemically amplified molecular resist design with switchable sensitivity for multi-lithography applications and nanopatterning
    Thakur, Neha
    Reddy, Pulikanti Guruprasad
    Nandi, Santu
    Yogesh, Midathala
    Sharma, Satinder K.
    Pradeep, Chullikkattil P.
    Ghosh, Subrata
    Gonsalves, Kenneth E.
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2017, 27 (12)
  • [46] Relationship between Sensitivity and Transmittance of Novolac Resist Exposed to Light Emitting Diodes
    Horiuchi, Toshiyuki
    Fujii, Takuya
    Nakamura, Ken
    Hirano, Hiroshi
    Ishikawa, Koichi
    Iwasaki, Jun-ya
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2010, 23 (03) : 451 - 456
  • [47] Study of RLS trade-off mitigation utilizing an organotin-containing chemically amplified resist for high sensitivity patterning
    Enomoto, Satoshi
    Machida, Kohei
    Naito, Michiya
    Kozawa, Takahiro
    INTERNATIONAL CONFERENCE ON EXTREME ULTRAVIOLET LITHOGRAPHY 2022, 2022, 12292
  • [48] Relationship between sensitivities of chemically amplified resist based on adamantane derivatives upon exposure to ArF excimer laser, electron beam, and extreme ultraviolet radiation
    Furukawa, Kikuo
    Kozawa, Takahiro
    Seki, Shu
    Tagawa, Seiichi
    APPLIED PHYSICS EXPRESS, 2008, 1 (06) : 0670011 - 0670013
  • [49] Correlation between proton. dynamics and line edge roughness in chemically amplified resist for post-optical lithography
    Saeki, Akinori
    Kozawa, Takahiro
    Tagawa, Seiichi
    Cao, Heidi B.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2006, 24 (06): : 3066 - 3072
  • [50] Relationship between sensitizer concentration and resist performance of chemically amplified extreme ultraviolet resists in sub-10nm half-pitch resolution region
    Kozawa, Takahiro
    Santillan, Julius Joseph
    Itani, Toshiro
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2017, 56 (01)
12345