Hysteresis in radio frequency capacitively coupled CF4 plasmas

被引:1
|
作者
Wang, Xiao-Kun [1 ,2 ]
Korolov, Ihor [2 ]
Wilczek, Sebastian [2 ,5 ]
Masheyeva, Ranna [3 ,4 ]
Liu, Yong-Xin [1 ]
Song, Yuan-Hong [1 ]
Hartmann, Peter [3 ]
Donko, Zoltan [3 ]
Schulze, Julian [2 ]
机构
[1] Dalian Univ Technol, Sch Phys, Key Lab Mat Modificat Laser Ion & Electron Beams, Minist Educ, Dalian 116024, Peoples R China
[2] Ruhr Univ Bochum, Chair Appl Electrodynam & Plasma Technol, Dept Elect Engn & Informat Sci, D-44801 Bochum, Germany
[3] HUN REN Wigner Res Ctr Phys, Inst Solid State Phys & Opt, H-1121 Budapest, Hungary
[4] Satbayev Univ, Dept Gen Phys, Alma Ata, Kazakhstan
[5] TH Georg Agr Univ, Bochum, Germany
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2024年 / 33卷 / 08期
基金
中国国家自然科学基金;
关键词
hysteresis; capacitively coupled CF4 plasma; particle in cell simulation; experimental diagnostics; FLUORINE-ATOMS; DISCHARGES; TRANSITION; KINETICS; IMPACT;
D O I
10.1088/1361-6595/ad5eb9
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Based on experiments and simulations, various plasma parameters are found to undergo a hysteresis as a function of the driving voltage amplitude in capacitively coupled CF4 discharges. Phase Resolved Optical Emission Spectroscopy reveals that the discharge operates in a hybrid combination of the drift-ambipolar and alpha-mode at low voltage. In this mode, the electric field and mean electron energy are high in the electronegative plasma bulk region. As the cross section for electron attachment is appreciable only at high electron energies, this mode results in strong negative ion production and keeps the electron density low as well as the mode of plasma operation stable, when the voltage is increased moderately. Increasing the driving voltage amplitude further ultimately induces a mode transition into a pure alpha-mode, once the electron density increases strongly. Decreasing the voltage again results in a reverse mode transition at a lower voltage compared to the previous mode transition, because the electron density is now initially high in the bulk and, thus, the bulk electric field and mean electron energy are low resulting in inefficient generation of negative ions via electron attachment. This keeps the electron density high even at lower driving voltages. This effect leads to the emergence of two steady states of plasma operation within a certain voltage range. The different electron energy distribution functions in these two states result in markedly different generation and density profiles of F atoms, with higher values occurring in the increasing voltage branch of the hysteresis. The ion flux and mean energy at the electrodes also differ. The voltage range, where the hysteresis occurs, is affected by the ion induced secondary electron coefficient (gamma). A larger value of gamma results in a shift of the hysteresis voltage range towards lower values.
引用
收藏
页数:14
相关论文
共 50 条
  • [41] Control of electron energy distributions and plasma characteristics of dual frequency, pulsed capacitively coupled plasmas sustained in Ar and Ar/CF4/O2
    Song, Sang-Heon
    Kushner, Mark J.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2012, 21 (05):
  • [42] Mass spectrometric measurements in inductively coupled CF4/Ar plasmas
    Rao, MVVS
    Sharma, SP
    Meyyappan, M
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2002, 11 (04): : 397 - 406
  • [43] Noninvasive method to measure the electron temperature in radio frequency capacitively coupled plasmas
    Lee, Hyo-Chang
    Chung, C-W
    Lee, M. H.
    Kim, J. H.
    APPLIED PHYSICS LETTERS, 2021, 118 (20)
  • [44] ATMOSPHERIC-PRESSURE, RADIO-FREQUENCY, CAPACITIVELY COUPLED HELIUM PLASMAS
    BLADES, MW
    SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1994, 49 (01) : 47 - 57
  • [45] Capacitively coupled radio-frequency plasmas excited by tailored voltage waveforms
    Lafleur, T.
    Delattre, P. A.
    Johnson, E. V.
    Booth, J. P.
    PLASMA PHYSICS AND CONTROLLED FUSION, 2013, 55 (12)
  • [46] Influence of magnetic field strength on capacitively coupled CF4 discharge at different pressures
    Yang, Shali
    Lin, Hanlei
    Zhang, Tianxiang
    Peng, Yanli
    Zhang, Qiang
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2022, 31 (12):
  • [47] Experimental investigations of the magnetic asymmetry effect in capacitively coupled radio frequency plasmas
    Oberberg, M.
    Kahaehn, J.
    Awakowicz, P.
    Schulze, J.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2018, 27 (10):
  • [48] Excitation of soliton like structures in radio-frequency capacitively coupled plasmas
    Elbadawy, A.
    Elkamash, I. S.
    El-Siragy, N. M.
    Shihab, M.
    PHYSICA SCRIPTA, 2024, 99 (09)
  • [49] PHOTODETACHMENT EFFECT IN A RADIO-FREQUENCY PLASMA IN CF4
    JAUBERTEAU, JL
    MEEUSEN, GJ
    HAVERLAG, M
    KROESEN, GMW
    DEHOOG, FJ
    APPLIED PHYSICS LETTERS, 1989, 55 (25) : 2597 - 2599
  • [50] Determination of Plasma Parameters in a Dual-Frequency Capacitively Coupled CF4 Plasma Using Optical Emission Spectroscopy
    刘文耀
    朱爱民
    李小松
    赵国利
    陆文琪
    徐勇
    王友年
    Plasma Science and Technology, 2013, 15 (09) : 885 - 890