Monolithic supercapacitors prepared by roll-to-roll screen printing

被引:0
|
作者
Punkari, Timo [1 ]
Kattainen, Aapo [1 ]
Fonseca, Alexandre [2 ]
Pronto, Joana [2 ]
Keskinen, Jari [1 ]
Mantysalo, Matti [1 ]
机构
[1] Tampere Univ, Tampere, Finland
[2] Ctr Nanotechnol & Smart Mat, Vila Nova De Famalicao, Portugal
关键词
Supercapacitor; Monolithic integration; Printed Electronics; Roll-to-roll; Screen printing;
D O I
10.1109/FLEPS61194.2024.10603726
中图分类号
TB3 [工程材料学]; R318.08 [生物材料学];
学科分类号
0805 ; 080501 ; 080502 ;
摘要
Roll-to-roll (R2R) screen printing was utilized to fabricate supercapacitors (SC) with monolithic structures. Layer-by-layer printing of SCs simplifies the fabrication process and enables increased production volume by the R2R process. Yield of 85 percent was achieved in R2R process with the thick three times printed separator layer. In addition, the printing process of the separator and electrode layers was improved by introducing an additional solvent. However, the key factor for good yield was the geometrical design of the separator layer. Increasing the thickness of the separator enabled a uniform top current collector for the R2R-printed monolithic SCs. This paper demonstrates and optimizes R2R printing process for the monolithic SC on polymer film, achieving a capacitance of 96.4 mF, an equivalent series resistance of 21.2 ohms, and a leakage current of 3.6 microA.
引用
收藏
页数:4
相关论文
共 50 条
  • [1] Multilayer Roll-to-Roll Screen-Printing for Printed Electronics Applications
    Salam, B.
    Shan, X. C.
    Cen Zhanhong
    Lok, B. K.
    2018 IEEE 20TH ELECTRONICS PACKAGING TECHNOLOGY CONFERENCE (EPTC), 2018, : 359 - 362
  • [2] Large Area Roll-to-Roll Screen Printing of Electrically Conductive Circuitries
    Salam, B.
    Shan, X. C.
    Jun, Wei
    PROCEEDINGS OF THE 2016 IEEE 18TH ELECTRONICS PACKAGING TECHNOLOGY CONFERENCE (EPTC), 2016, : 250 - 253
  • [3] ALIGNMENT AND ERROR ANALYSIS TO IMPROVE OVERLAY ACCURACY IN ROLL-TO-ROLL SCREEN PRINTING
    Kim, Daehyeon
    Kim, Youngjin
    Kim, Hyeongrae
    Kim, Juyeon
    Kang, Jongmo
    Oh, Dongho
    PROCEEDINGS OF THE ASME 2023 32ND CONFERENCE ON INFORMATION STORAGE AND PROCESSING SYSTEMS, ISPS2023, 2023,
  • [4] Registration error analysis and compensation of roll-to-roll screen printing system for flexible electronics
    Gafurov, Anton Nailevich
    Jeong, Jaehyeong
    Park, Pyoungwon
    Kim, Inyoung
    Thanh Huy Phung
    Kim, Hyun-Chang
    Kang, Dongwoo
    Oh, Dongho
    Lee, Taik-Min
    FLEXIBLE AND PRINTED ELECTRONICS, 2022, 6 (02):
  • [5] Roll-to-Roll Printing of Perovskite Solar Cells
    Dou, Benjia
    Whitaker, James B.
    Bruening, Karsten
    Moore, David T.
    Wheeler, Lance M.
    Ryter, John
    Breslin, Nicholas J.
    Berry, Joseph J.
    Garner, Sean M.
    Barnes, Frank S.
    Shaheen, Sean E.
    Tassone, Christopher J.
    Zhu, Kai
    van Hest, Maikel F. A. M.
    ACS ENERGY LETTERS, 2018, 3 (10): : 2558 - 2565
  • [6] Roll-to-roll printing of spatial wearable thermoelectrics
    Zhang, Zimeng
    Wang, Biran
    Qiu, Jingjing
    Wang, Shiren
    MANUFACTURING LETTERS, 2019, 21 : 28 - 34
  • [7] Printing pressure uniformization of a roll-to-roll system using roll runout
    Youngjin Kim
    Moonsoo Kim
    Taehyeong Kim
    Jihyeon Kim
    Dongho Oh
    Microsystem Technologies, 2018, 24 : 4561 - 4568
  • [8] Printing pressure uniformization of a roll-to-roll system using roll runout
    Kim, Youngjin
    Kim, Moonsoo
    Kim, Taehyeong
    Kim, Jihyeon
    Oh, Dongho
    MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS, 2018, 24 (11): : 4561 - 4568
  • [9] Roll-to-Roll Gravure with Nanomaterials for Printing Smart Packaging
    Jung, Minhun
    Kim, Junseok
    Koo, Hyunmo
    Lee, Wookyu
    Subramanian, Vivek
    Cho, Gyoujin
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2014, 14 (02) : 1303 - 1317
  • [10] An ESN based Modeling for Roll-to-Roll Printing Systems
    Chen, Zhihua
    Zhang, Tao
    Zhang, Zheng
    PROCEEDINGS OF 2020 IEEE 9TH DATA DRIVEN CONTROL AND LEARNING SYSTEMS CONFERENCE (DDCLS'20), 2020, : 53 - 58