Perpendicular magnetic anisotropy of Pd/Co2MnSi/AlN/Pd multilayer films☆

被引:0
|
作者
Qin, Xiaoqi [1 ]
Guo, Bin [1 ]
Tan, Jiaxing [1 ]
Xiu, Xianwu [1 ]
Cao, Wentian [1 ]
Wang, Shuyun [1 ]
机构
[1] Shandong Normal Univ, Sch Phys & Elect, Jinan 250358, Peoples R China
关键词
Perpendicular Magnetic Anisotropy (PMA); Co2MnSi(CMS); AlN; Hall Resistance (R-Hall); Coercive force (H-C);
D O I
10.1016/j.jmmm.2024.172143
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper, the perpendicular magnetic anisotropy(PMA)of Pd/Co2MnSi (CMS)/AlN/Pd multilayer film is studied, which is designed based on the two-interface interaction, the orbital hybridization effect of Pd5d-Co3d electrons at the Pd/CMS interface and the orbital hybridization effect of Co3d-N2p electrons at the CMS/AlN interface. Compared with the Pd/CMS/Pd multilayer film, the PMA of the Pd/CMS/AlN/Pd structure shows significant enhancement with the insertion of the AlN layer. The Hall resistance (RHall) of the Pd/CMS/AlN/Pd structure reached 0.02 Omega (increased by 300 %) and the coercive force (Hc) is 388 Oe (increased by about 76 %). The magnetic anisotropic energy density (Keff) is 0.61Merg/cm3 (increased by about 135 %). The PMA was optimized with the film factor (layer thickness) of Pd(6 nm)/CMS(5 nm)/AlN(6 nm)/Pd(6 nm). The X-Ray Diffraction(XRD)and High Resolution Transmission Electron Microscope(HRTEM)analysis showed that the PMA is affected by the crystallinity and interface quality of multilayer films.
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页数:8
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