Behavior of defects in GaN avalanche photodiodes grown on GaN substrates

被引:1
作者
Yang, Fan [1 ,2 ]
Gong, Ziye [1 ,3 ]
Shi, Fan [1 ,2 ]
Xu, Jintong [1 ]
Li, Xiangyang [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Tech Phys, Shanghai 200083, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] Univ Shanghai Sci & Technol, Shanghai 200093, Peoples R China
关键词
GaN avalanche photodiodes; defect-assisted tunneling; defect luminescence; current responsivity; DEEP-LEVEL DEFECTS; N-TYPE GAN; PHOTOLUMINESCENCE; CENTERS; DIODES;
D O I
10.35848/1347-4065/ad776d
中图分类号
O59 [应用物理学];
学科分类号
摘要
GaN avalanche photodiodes grown on GaN substrates were successfully fabricated. These devices displayed a low dark current, measuring <80 pA at a reverse bias of 82.0 V. Notably, the response spectrum of the devices showed new out-of-band response peaks with increasing reverse bias. Moreover, at high reverse bias, the devices emitted visible light. These phenomena were attributed to inherent defects within the materials. The defect level fitted from the tunneling currents closely matched the experimental value, indicating that the defect-assisted tunneling effect, with a defect level at 0.127 eV relative to the conduction band, contributed to the out-of-band response peak in the response spectrum. The Franz-Keldysh effect led to a redshift in the response spectrum. Additionally, the Mg-related deep energy level situated approximately 0.498 eV above the valence band, facilitated radiative recombination at high reverse bias. Meanwhile, the device's luminescent image displayed a consistently square shape, suggesting uniform avalanche breakdown throughout the device.
引用
收藏
页数:7
相关论文
共 47 条
[1]  
Akasaki I., 1991, Journal of Luminescence, V48-49, P666, DOI 10.1016/0022-2313(91)90215-H
[2]   Microwave annealing of Mg-implanted and in situ Be-doped GaN [J].
Aluri, Geetha S. ;
Gowda, Madhu ;
Mahadik, Nadeemullah A. ;
Sundaresan, Siddarth G. ;
Rao, Mulpuri V. ;
Schreifels, John A. ;
Freitas, J. A., Jr. ;
Qadri, S. B. ;
Tian, Y. -L. .
JOURNAL OF APPLIED PHYSICS, 2010, 108 (08)
[3]   Low-dislocation-density GaN from a single growth on a textured substrate [J].
Ashby, CIH ;
Mitchell, CC ;
Han, J ;
Missert, NA ;
Provencio, PP ;
Follstaedt, DM ;
Peake, GM ;
Griego, L .
APPLIED PHYSICS LETTERS, 2000, 77 (20) :3233-3235
[4]   Electrical Characterization of Metastable Defects Introduced in GaN by Eu-Ion Implantation [J].
Auret, F. Danie ;
Meyer, Walter E. ;
Diale, M. ;
van Rensburg, P. J. Janse ;
Song, S. F. ;
Temst, K. ;
Vantomme, A. .
SILICON CARBIDE AND RELATED MATERIALS 2010, 2011, 679-680 :804-+
[5]   Franz-Keldysh effect in GaN nanowires [J].
Cavallini, A. ;
Polenta, L. ;
Rossi, M. ;
Stoica, T. ;
Calarco, R. ;
Meijers, R. J. ;
Richter, T. ;
Lueth, H. .
NANO LETTERS, 2007, 7 (07) :2166-2170
[6]   Geiger-mode operation of ultraviolet avalanche photodiodes grown on sapphire and free-standing GaN substrates [J].
Cicek, E. ;
Vashaei, Z. ;
McClintock, R. ;
Bayram, C. ;
Razeghi, M. .
APPLIED PHYSICS LETTERS, 2010, 96 (26)
[7]   Dislocation-related electron capture behaviour of traps in n-type GaN [J].
Fang, ZQ ;
Look, DC ;
Polenta, L .
JOURNAL OF PHYSICS-CONDENSED MATTER, 2002, 14 (48) :13061-13068
[8]  
GOTZ W, 1994, APPL PHYS LETT, V65, P463, DOI 10.1063/1.112337
[9]   High breakdown voltage p-n diodes on GaN on sapphire by MOCVD [J].
Gupta, Chirag ;
Enatsu, Yuuki ;
Gupta, Geetak ;
Keller, Stacia ;
Mishra, Umesh K. .
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2016, 213 (04) :878-882
[10]   ANALYSIS OF DEEP LEVELS IN N-TYPE GAN BY TRANSIENT CAPACITANCE METHODS [J].
HACKE, P ;
DETCHPROHM, T ;
HIRAMATSU, K ;
SAWAKI, N ;
TADATOMO, K ;
MIYAKE, K .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (01) :304-309