Electron density measurement of Ar, N2, O2, and Ar mixtures (with N2 and O2) gas in inductively coupled plasma (ICP) using terahertz time domain spectroscopy

被引：0

作者：

Kim, Sang-Il ^{[1
]}

Park, Dong-Woon ^{[1
]}

Kim, Heon-Su ^{[1
]}

Kim, Hak-Sung ^{[1
,2
]}

机构：

[1] Hanyang Univ, Dept Mech Convergence Engn, 222 Wangsimni Ro, Seoul, South Korea

[2] Hanyang Univ, Hanyang Inst Smart Semicond, 222 Wangsimni Ro, Seoul, South Korea

来源：

OPTICS AND LASER TECHNOLOGY | 2025年 / 180卷

基金：

新加坡国家研究基金会;

关键词：

Diagnosis; Inductively coupled plasma; Plasma; Terahertz radiation; Electron density;

D O I：

10.1016/j.optlastec.2024.111540

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In this study, an inspection method using terahertz waves was proposed for the diagnosis of electron density using inductively coupled plasma (ICP). Plasma with low and high electron density for Ar, N2, O2, and Ar mixed (with N2 and O2) gases was generated by varying the RF power of the ICP and mass flow rate. Based on the theoretical analysis about propagation characteristics of the THz waves in Ar, N2, O2, and Ar mixed (with N2 and O2) gas plasma, the electron density of the ICP was measured according to RF power and mass flow rate. These results were verified using a Langmuir probe that can measure the electron density distribution.

引用

页数：8

共 33 条

[11] Electron density characterization of inductively-coupled argon plasmas by the terahertz time-domain spectroscopy [J].

Jang, Dogeun ;

Uhm, Han Sup ;

Jang, Donggyu ;

Hur, Min Sup ;

Suk, Hyyong .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 2016, 25 (06)

[12] Plasma density measurements using THz pulses from laser-plasmas [J].

Kang, K. ;

Jang, D. ;

Suk, H. .

JOURNAL OF INSTRUMENTATION, 2017, 12

[13] Real-Time Plasma Uniformity Monitoring via Selective Plasma Light Intensity Measurement Using Transparent-LCD-Module-Adapted Optical Emission Spectroscopy [J].

Kim, In Joong ;

Park, Chuntaek ;

Shin, Dongseok ;

Yun, Ilgu .

IEEE SENSORS JOURNAL, 2021, 21 (02) :2256-2262

[14] Plasma characterization with terahertz pulses [J].

Kolner, B. H. ;

Buckles, R. A. ;

Conklin, P. M. ;

Scott, R. P. .

IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2008, 14 (02) :505-512

[15] Measurement of the total energy losses per electron-ion lost in various mixed gas inductively coupled plasmas [J].

Ku, Ju-Hwan ;

Lee, Young-Kwang ;

Chung, Chin-Wook .

PHYSICS OF PLASMAS, 2010, 17 (04)

[16] E-H mode transition in inductively coupled plasma using Ar, O2, N2, and mixture gas [J].

Lee, Jung-Kyu ;

Lee, Hyo-Chang ;

Chung, Chin-Wook .

CURRENT APPLIED PHYSICS, 2011, 11 (05) :S149-S153

[17] Floating probe for electron temperature and ion density measurement applicable to processing plasmas [J].

Lee, Min-Hyong ;

Jang, Sung-Ho ;

Chung, Chin-Wook .

JOURNAL OF APPLIED PHYSICS, 2007, 101 (03)

[18] Thermal Atomic Layer Etching of Al2O3, HfO2, and ZrO2 Using Sequential Hydrogen Fluoride and Dimethylaluminum Chloride Exposures [J].

Lee, Younghee ;

George, Steven M. .

JOURNAL OF PHYSICAL CHEMISTRY C, 2019, 123 (30) :18455-18466

[19] Reactive plasma cleaning and restoration of transition metal dichalcogenide monolayers [J].

Marinov, Daniil ;

de Marneffe, Jean-Francois ;

Smets, Quentin ;

Arutchelvan, Goutham ;

Bal, Kristof M. ;

Voronina, Ekaterina ;

Rakhimova, Tatyana ;

Mankelevich, Yuri ;

El Kazzi, Salim ;

Nalin Mehta, Ankit ;

Wyndaele, Pieter-Jan ;

Heyne, Markus Hartmut ;

Zhang, Jianran ;

With, Patrick C. ;

Banerjee, Sreetama ;

Neyts, Erik C. ;

Asselberghs, Inge ;

Lin, Dennis ;

De Gendt, Stefan .

NPJ 2D MATERIALS AND APPLICATIONS, 2021, 5 (01)

[20] Multi-staged deposition of trench-gate oxides for power MOSFETs [J].

Neuber, Markus ;

Storbeck, Olaf ;

Langner, Maik ;

Stahrenberg, Knut ;

Mikolajick, Thomas .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2019, 37 (03)

← 1 2 3 4 →