Fabrication of Conductive Domain Walls in x-cut Congruent Thin-film Lithium Niobate Using an Electrical-field Poling Technique (Invited)

Conductive ferroelectric domain walls have attracted increasing research interest in the field of nanoelectronics, and the fabrication technique for such domain walls is vital. In this study, we investigated in detail the fabrication of conductive domain walls in x-cut congruent thin-film lithium niobate (TFLN) using an electrical- field poling technique. The ferroelectric domain structures can be controlled through the applied electrical field and applied pulse numbers, and the domain inversion process is related to the conduction characteristics of the domain walls. The domain structures in TFLN are revealed using confocal second-harmonic microscopy and piezoresponse force microscopy. The results provide further directions for the development and application of conductive domain walls in TFLN.