Engineering of Active and Passive Loss in High-Quality-Factor Vanadium Dioxide-Based BIC Metasurfaces

被引:5
作者
Aigner, Andreas [1 ]
Ligmajer, Filip [2 ,3 ]
Rovenska, Katarina [2 ,3 ]
Holobradek, Jakub [2 ]
Idesova, Beata [2 ,3 ]
Maier, Stefan A. [4 ,5 ]
Tittl, Andreas [1 ]
Menezes, Leonardo de S. [1 ,6 ]
机构
[1] Ludwig Maximilians Univ Munchen, Fac Phys, Nanoinst Munich, Chair Hybrid Nanosyst, D-80539 Munich, Germany
[2] Brno Univ Technol, Cent European Inst Technol, Brno 61200, Czech Republic
[3] Brno Univ Technol, Inst Phys Engn, Fac Mech Engn, Brno 61669, Czech Republic
[4] Monash Univ, Sch Phys & Astron, Clayton, Vic 3800, Australia
[5] Imperial Coll London, Dept Phys, London SW7 2AZ, England
[6] Univ Fed Pernambuco, Dept Fis, BR-50670901 Recife, PE, Brazil
基金
英国工程与自然科学研究理事会; 欧洲研究理事会;
关键词
Active metasurfaces; bound states in thecontinuum; vanadium dioxide; loss tunability; near-fieldtunability; BOUND-STATES; RESONANCES;
D O I
10.1021/acs.nanolett.4c01703
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Active functionalities of metasurfaces are of growing interest in nanophotonics. The main strategy employed to date is spectral resonance tuning affecting predominantly the far-field response. However, this barely influences other essential resonance properties like near-field enhancement, signal modulation, quality factor, and absorbance, which are all vital for numerous applications. Here we introduce an active metasurface approach that combines temperature-tunable losses in vanadium dioxide with far-field coupling tunable symmetry-protected bound states in the continuum. This method enables exceptional precision in independently controlling both radiative and nonradiative losses. Consequently, it allows for the adjustment of both the far-field response and, notably, the near-field characteristics like local field enhancement and absorbance. We experimentally demonstrate continuous tuning from under- through critical- to overcoupling, achieving quality factors of 200 and a relative switching contrast of 78%. Our research marks a significant step toward highly tunable metasurfaces, controlling both near- and far-field properties.
引用
收藏
页码:10742 / 10749
页数:8
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