Highly Flexible Dielectric Platform for Post-CMOS Photonics

被引：0

作者：

Westhues, Marcus ^{[1
]}

Geruschke, Thomas ^{[1
]}

Hauser, Julia ^{[1
]}

Burkard, Roman ^{[2
]}

Nesic, Aleksandar ^{[1
]}

Schall-Giesecke, Anna Lena ^{[1
,2
,3
]}

机构：

[1] Fraunhofer Inst Microelect Circuits & Syst IMS, Finkenstr 61, D-47057 Duisburg, Germany

[2] Univ Duisburg Essen UDE, Dept Elect Components & Circuits EBS, Bismarckstr 81, D-47057 Duisburg, Germany

[3] Ctr Nanointegrat Duisburg Essen CENIDE, Carl Benz Str 199, D-47057 Duisburg, Germany

来源：

25TH EUROPEAN CONFERENCE ON INTEGRATED OPTICS, ECIO 2024 | 2024年 / 402卷

关键词：

integrated optics; post-CMOS; waveguides; visible wavelengths; optical lithography;

D O I：

10.1007/978-3-031-63378-2_96

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We present a photonic technological development service that includes an 8 '' wafer-scale optical-lithography photonic platform customizable to application-specific needs. Our platform offers a choice of waveguide materials and deposition techniques. Low-temperature deposition techniques, in particular, allow for CMOS-compatibility and electronic-photonic co-integration (post-CMOS). We show results of experimental characterization of photonic waveguides and ring resonators fabricated in initial fabrication runs in silicon nitride (Si3N4 and SixNy) and tantalum pentoxide (Ta2O5) layers. The results of transmission measurements in the C-band and at visible wavelengths indicate that performance of our devices is on par with those of established players in the field.

引用

页码：585 / 592

页数：8

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