Effect of pulse interval on deposition of diamond-like carbon through high-power impulse magnetron sputtering

被引：0

作者：

Ohta, Takayuki ^{[1
]}

Kunieda, Hiro ^{[1
]}

Harigai, Toru ^{[2
]}

Oda, Akinori ^{[3
]}

Kousaka, Hiroyuki ^{[2
,4
]}

机构：

[1] Meijo Univ, Dept Elect & Elect Engn, 1-501 Shiogamaguchi,Tempaku Ku, Nagoya 4688502, Japan

[2] Gifu Univ, Ctr Appl Res Plasma, 1-1 Yanagido, Gifu 5011193, Japan

[3] Chiba Inst Technol, Dept Elect & Elect Engn, 2-17-1 Tsudanuma, Narashino 2750016, Japan

[4] Gifu Univ, Dept Mech Engn, 1-1 Yanagido, Gifu 5011193, Japan

来源：

关键词：

High-power impulse magnetron sputtering; Diamond-like carbon; Pulse interval; Ion flux; Film hardness; SUPER-LOW-FRICTION; COATINGS; FILMS; TRIBOLOGY;

D O I：

10.1016/j.diamond.2024.111424

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A diamond-like carbon (DLC) film was deposited using unipolar-double-pulse high-power pulsed magnetron sputtering, aimed at enhancing both film density and deposition rate. The pulse interval between the 1st and 2nd pulses, with negative polarity applied to the target, was varied from 15 to 200 mu s. Temporal variations in the flux and energy of C+ + and Ar+ + incident to the DLC film were analyzed through energy-resolved and time-resolved mass spectrometry to clarify the ion generation process during the 1st and 2nd pulses. The contribution of ionic species in forming the DLC film through HiPIMS was clarified through mass spectrometry, Raman scattering spectroscopy, and X-ray reflectivity analyses. Reducing the pulse interval increased the deposition rate, and the film density of the DLC film was improved at a pulse interval of approximately 40 mu s. Overall, the implementation of a double pulse with the appropriate pulse interval can help enhance both the film density and deposition rate.

引用

页数：6

共 43 条

[1] A strategy for increased carbon ionization in magnetron sputtering discharges [J].