HfAlOx-based ferroelectric memristor for nociceptor and synapse functions

被引:1
作者
Ju, Dongyeol [1 ]
Park, Yongjin [1 ]
Noh, Minseo [1 ]
Koo, Minsuk [2 ]
Kim, Sungjun [1 ]
机构
[1] Dongguk Univ, Div Elect & Elect Engn, Seoul 04620, South Korea
[2] Incheon Natl Univ, Dept Comp Sci & Engn, Incheon 22012, South Korea
基金
新加坡国家研究基金会;
关键词
TUNNEL-JUNCTION; DOPED HFO2; POLARIZATION; DEVICES; STORAGE; MEMORY; CHARGE;
D O I
10.1063/5.0224896
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Efficient data processing is heavily reliant on prioritizing specific stimuli and categorizing incoming information. Within human biological systems, dorsal root ganglions (particularly nociceptors situated in the skin) perform a pivotal role in detecting external stimuli. These neurons send warnings to our brain, priming it to anticipate potential harm and prevent injury. In this study, we explore the potential of using a ferroelectric memristor device structured as a metal-ferroelectric-insulator-semiconductor as an artificial nociceptor. The aim of this device is to electrically receive external damage and interpret signals of danger. The TiN/HfAlOx (HAO)/HfSiOx (HSO)/n(+) Si configuration of this device replicates the key functions of a biological nociceptor. The emulation includes crucial aspects, such as threshold reactivity, relaxation, no adaptation, and sensitization phenomena known as "allodynia" and "hyperalgesia." Moreover, we propose establishing a connection between nociceptors and synapses by training the Hebbian learning rule. This involves exposing the device to injurious stimuli and using this experience to enhance its responsiveness, replicating synaptic plasticity.
引用
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页数:12
相关论文
共 85 条
[1]   A Complementary Metal Oxide Semiconductor Process-Compatible Ferroelectric Tunnel Junction [J].
Ambriz-Vargas, Fabian ;
Kolhatkar, Gitanjali ;
Broyer, Maxime ;
Hadj-Youssef, Azza ;
Nouar, Rafik ;
Sarkissian, Andranik ;
Thomas, Reji ;
Gomez-Yanez, Carlos ;
Gauthier, Marc A. ;
Ruediger, Andreas .
ACS APPLIED MATERIALS & INTERFACES, 2017, 9 (15) :13262-13268
[2]   Top Electrode Engineering for Freedom in Design and Implementation of Ferroelectric Tunnel Junctions Based on Hf1-xZrxO2 [J].
Athle, Robin ;
Persson, Anton E. O. ;
Troian, Andrea ;
Borg, Mattias .
ACS APPLIED ELECTRONIC MATERIALS, 2022, 4 (03) :1002-1009
[3]   Low-power linear computation using nonlinear ferroelectric tunnel junction memristors [J].
Berdan, Radu ;
Marukame, Takao ;
Ota, Kensuke ;
Yamaguchi, Marina ;
Saitoh, Masumi ;
Fujii, Shosuke ;
Deguchi, Jun ;
Nishi, Yoshifumi .
NATURE ELECTRONICS, 2020, 3 (05) :259-266
[4]   Phase transitions in ferroelectric silicon doped hafnium oxide [J].
Boescke, T. S. ;
Teichert, St. ;
Braeuhaus, D. ;
Mueller, J. ;
Schroeder, U. ;
Boettger, U. ;
Mikolajick, T. .
APPLIED PHYSICS LETTERS, 2011, 99 (11)
[5]   Emulating low power nociceptive functionalities with a forming-free SiO2/VOx conductive bridge memory with Pt nanoparticles [J].
Bousoulas, P. ;
Tsioustas, Ch ;
Tsoukalas, D. .
APPLIED PHYSICS LETTERS, 2022, 120 (25)
[6]   Response properties of mechanoreceptors and nociceptors in mouse glabrous skin: an in vivo study [J].
Cain, DM ;
Khasabov, SG ;
Simone, DA .
JOURNAL OF NEUROPHYSIOLOGY, 2001, 85 (04) :1561-1574
[7]   Improving linearity by introducing Al in HfO2 as a memristor synapse device [J].
Chandrasekaran, Sridhar ;
Simanjuntak, Firman Mangasa ;
Saminathan, R. ;
Panda, Debashis ;
Tseng, Tseung-Yuen .
NANOTECHNOLOGY, 2019, 30 (44)
[8]   Impact of Oxygen Vacancy on Ferroelectric Characteristics and Its Implication for Wake-Up and Fatigue of HfO2-Based Thin Films [J].
Chen, Jiajia ;
Jin, Chengji ;
Yu, Xiao ;
Jia, Xiaole ;
Peng, Yue ;
Liu, Yan ;
Chen, Bing ;
Cheng, Ran ;
Han, Genquan .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2022, 69 (09) :5297-5301
[9]   Ultra-low power Hf0.5Zr0.5O2 based ferroelectric tunnel junction synapses for hardware neural network applications [J].
Chen, Lin ;
Wang, Tian-Yu ;
Dai, Ya-Wei ;
Cha, Ming-Yang ;
Zhu, Hao ;
Sun, Qing-Qing ;
Ding, Shi-Jin ;
Zhou, Peng ;
Chua, Leon ;
Zhang, David Wei .
NANOSCALE, 2018, 10 (33) :15826-15833
[10]   Effect of temperature on the electrical properties of a metal-ferroelectric (SrBi2Ta2O9)-insulator (HfTaO)-silicon capacitor [J].
Chen, Y. Q. ;
Xu, X. B. ;
Lei, Z. F. ;
Liao, X. Y. ;
Wang, X. ;
Zeng, C. ;
En, Y. F. ;
Huang, Y. .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2015, 48 (03)