Controllable variable beam diameter ion source based on the Einzel lens

With the development of modern optical systems, high-power laser systems, ultraviolet lithography systems, etc., the requirements for the precision and processing efficiency of optical components continue to increase. Although sub-nanometer precision can be achieved with current ion beam figuring, the introduction of additional removal layers greatly limits its machining efficiency due to the inability of the machine dynamics to satisfy the velocity and acceleration requirements mathematically. Therefore, an efficient figuring technology of controllable variable beam diameter ion beam based on the Einzel lens has been proposed. The simulation results show that the ion beam diameter can be effectively controlled by adjusting the voltage of the Einzel lens. The experimental results show that the ion source can control the ion beam diameter by voltage, and then change the size of the ion beam, and obtain a very small removal function. The FWHM is reduced from 12.1 mm to 10.1 mm, and the peak removal rate is increased by 1.7 times, which significantly improves the removal efficiency and figuring ability. Therefore, this work aims to improve the accuracy of ion beam figuring of high-power laser optical components and address the problem of reduced efficiency caused by additional removal layers in the existing figuring process.