Impact of e-beam lithography and data preparation optimization on optical performance of integrated photonic waveguides

被引：1

作者：

Greul, M. ^{[1
]}

Edelmann, K. ^{[1
]}

Fasold, S. ^{[2
]}

Hartbaum, J. ^{[1
]}

Linn, E. ^{[2
]}

Stolberg, I. ^{[2
]}

Weidenmueller, U. ^{[2
]}

机构：

[1] Inst Mikroelekt Stuttgart IMS CHIPS, Allmandring 30a, Stuttgart, Germany

[2] Vistec Electron Beam GmbH, Ilmstr 4, Jena, Germany

来源：

NOVEL PATTERNING TECHNOLOGIES 2024 | 2024年 / 12956卷

关键词：

electron beam lithography; variable shaped beam; photonic waveguides; data preparation; JES Approximation; non-Manhattan layouts;

D O I：

10.1117/12.3010355

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Integrated photonics offer a miniaturization potential for applications like sensing, data communication, as well as emerging quantum technologies. In this paper we show optical loss measurements for different e-beam approximation, data preparation, and exposure strategies concerning optical waveguides. The focus is on both, the decrease of e-beam writing time and the reduction of optical loss, which is achieved by applying Vistec's shot count optimized and edge roughness aware JES Approximation, as compared to the common Border Approximation.

引用

页数：11

共 15 条

[1] Advances in Silicon Quantum Photonics [J].

Adcock, Jeremy C. ;

Bao, Jueming ;

Chi, Yulin ;

Chen, Xiaojiong ;

Bacco, Davide ;

Gong, Qihuang ;

Oxenlowe, Leif K. ;

Wang, Jianwei ;

Ding, Yunhong .

IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS, 2021, 27 (02)

[2] Universal Design of Waveguide Bends in Silicon-on-Insulator Photonics Platform [J].

Bahadori, Meisam ;

Nikdast, Mahdi ;

Cheng, Qixiang ;

Bergman, Keren .

JOURNAL OF LIGHTWAVE TECHNOLOGY, 2019, 37 (13) :3044-3054

[3] Electron beam lithography writing strategies for low loss, high confinement silicon optical waveguides [J].

Bojko, Richard J. ;

Li, Jing ;

He, Li ;

Baehr-Jones, Tom ;

Hochberg, Michael ;

Aida, Yukinori .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2011, 29 (06)

[4]

Choi J, 2022, Status of curvilinear data format working group, V28

[5]

Doylend J. K., 2020, Proceedings of SPIE, V11285, P17

[6]

Higo A, 2019, IEEE INT C MICROELEC, P4, DOI [10.1109/ICMTS.2019.8730981, 10.1109/icmts.2019.8730981]

[7] THE EVOLUTION OF SILICON-WAFER CLEANING TECHNOLOGY [J].

KERN, W .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (06) :1887-1892

[8] Efficient exposure of non-Manhattan layouts for optical applications using variable shaped beam lithography [J].

Linn, Eike ;

Fasold, Stefan ;

Stolberg, Ines ;

Weidenmueller, Ulf .

JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, 2023, 22 (04)

[9] Silicon Photonic Biosensors Using Label-Free Detection [J].

Luan, Enxiao ;

Shoman, Hossam ;

Ratner, Daniel M. ;

Cheung, Karen C. ;

Chrostowski, Lukas .

SENSORS, 2018, 18 (10)

[10]

Reed G. T., 2005, Silicon Photonics: An Introduction

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