Advances in Engineering Toolkits for Construction of Ultralow Disordered Van der Waals Heterostructures

被引:1
作者
Huang, Zhujun [1 ]
Shahrjerdi, Davood [1 ]
机构
[1] NYU, Elect & Comp Engn, Brooklyn, NY 11201 USA
基金
美国国家科学基金会;
关键词
interface cleaning; graphene; heterostructure; moire superlattice; van der Waals; HEXAGONAL BORON-NITRIDE; MAGIC-ANGLE; 2D MATERIALS; 2-DIMENSIONAL MATERIALS; TWIST-ANGLE; GRAPHENE; INTERFACES; CRYSTALS; SUPERCONDUCTIVITY; SUPERLATTICES;
D O I
10.1002/adfm.202314439
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The exploration of emerging quantum phenomena by stacking dissimilar atomic layered materials into van der Waals (vdW) heterostructures has driven the development of layer assembly techniques. Achieving ultralow disorder within these heterostructures is crucial for unlocking their novel physical properties. However, current fabrication methods for designer heterostructures have limitations in throughput, yield, and scalability. Over the past decade, engineering toolkits have evolved to address some of these challenges, but their adoption for fabricating designer heterostructures remains limited. In this review, an overview of these emerging engineering toolkits is provided, and examine their utility and limitations in achieving ultralow disordered heterostructures. It is hoped that the insights from this review article can help guide future research directions on advancing the fabrication process of designer heterostructures. This review outlines emerging engineering methods aimed at producing ultralow disordered heterostructures, crucial for exploring quantum phenomena. Despite significant progress, barriers to widespread implementation remain, highlighting the need for continued research in further advancing the fabrication toolkits. image
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页数:18
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