Closed-Loop Control of Photonic Ring Resonators by Means of Photo-Thermal Plasmonic Sensors

被引:0
作者
Tria, Alessandro di [1 ]
Martinez, Andres [1 ]
Grimaldi, Vittorio [1 ]
Zanetto, Francesco [1 ]
Bongiorno, Sergio [1 ]
Kohli, Manuel [3 ]
Chatzitheocharis, Dimitrios [4 ]
Koch, Ueli [3 ]
Leuthold, Juerg [3 ]
Sharma, Deepak K. [5 ]
Bouhelier, Alexandre [5 ]
Melloni, Andrea [1 ]
Morichetti, Francesco [1 ]
Ferrari, Giorgio [2 ]
Sampietro, Marco [1 ]
机构
[1] Politecn Milan, Dept Elect Informat & Bioengn, I-20133 Milan, Italy
[2] Politecn Milan, Dept Phys, I-20133 Milan, Italy
[3] Swiss Fed Inst Technol, Inst Electromagnet Fields, CH-8092 Zurich, Switzerland
[4] Aristotle Univ Thessaloniki, Sch Phys, Thessaloniki 54124, Greece
[5] Univ Bourgogne, Lab Interdisciplinaire Carnot Bourgogne, CNRS, UMR 6303, F-21000 Dijon, France
基金
欧盟地平线“2020”;
关键词
Sensors; Detectors; Silicon; Optical waveguides; Metals; Plasmons; Optical detectors; Plasmonic sensor; transparent detector; integrated photonics; optical bolometry; closed-loop stabilization;
D O I
10.1109/JLT.2023.3348503
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper highlights the effectiveness of photo-thermal plasmonic sensors in enabling real-time closed-loop stabilization of photonic devices. To assess the waveguided optical power, the in-line detector leverages the photo-thermal resistance variation of a micrometric plasmonic strip in contact with the waveguide. The generated signal is used to lock to resonance a ring resonator against wavelength and temperature variations, in a silicon-based technology. Thanks to the high sensitivity of the detector and its limited penalty on the waveguide loss, automatic re-tuning of the ring resonator with a recovery time of 20 ms has been successfully achieved. The micrometric dimensions of the sensor, its technological simplicity, and the delivered signal (proportional to the optical power) make the photo-thermal plasmonic sensor an attractive in-line candidate for closed-loop control of optical devices, regardless of the technology employed for the photonic chip fabrication.
引用
收藏
页码:2901 / 2907
页数:7
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