Pulsed Force Kelvin Probe Force Microscopy-A New Type of Kelvin Probe Force Microscopy under Ambient Conditions

被引：6
作者：
Zahmatkeshsaredorahi, Amirhossein [1 ]
Jakob, Devon S. [1 ]
Xu, Xiaoji G. [1 ]
机构：
[1] Lehigh Univ, Dept Chem, Bethlehem, PA 18015 USA
来源：
JOURNAL OF PHYSICAL CHEMISTRY C | 2024年 / 128卷 / 24期
基金：
美国国家科学基金会;
关键词：
CONTACT POTENTIAL DIFFERENCE; WORK FUNCTION; SOLAR-CELLS; SURFACE; ORIENTATION; MODULATION; DEFECTS; MODE;
D O I：
10.1021/acs.jpcc.4c01461
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Kelvin probe force microscopy (KPFM) is an increasingly popular scanning probe microscopy technique used for nanoscale imaging of surface potential for various materials, such as metals, semiconductors, biological samples, and photovoltaics, to reveal their surface work function and/or local accumulation of charges. This featured review outlines the operation principles and applications of KPFM, including several typical commercially available variants. We highlight the significance of surface potential measurements, present the details of the method operation, and discuss the causes of the limitation on spatial resolution. Then, we present the pulsed force Kelvin probe force microscopy (PF-KPFM) as an innovative improvement to KPFM, which provides an enhanced spatial resolution of <10 nm under ambient conditions. PF-KPFM is promising for the characterization of heterogeneous materials with spatial variations of electrical properties. It will be especially instrumental for investigating emerging perovskite photovoltaics, heterogeneous catalysts, 2D materials, and ferroelectric materials, among others.
引用
收藏
页码：9813 / 9827
页数：15
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