Heavy-Ion-Induced Displacement Damage Effects on WOx ECRAM

被引:1
作者
Marinella, Matthew J. [1 ]
Bennett, Christopher H. [2 ]
Zutter, Brian [3 ]
Siath, Max [1 ]
Spear, Matthew [1 ]
Vizkelethy, Gyorgy [2 ]
Fuller, Elliot [3 ]
Xiao, T. Patrick [2 ]
Hughart, David [2 ]
Agarwal, Sapan [3 ]
Li, Yiyang [4 ]
Talin, A. Alec [3 ]
机构
[1] Arizona State Univ, Elect Comp & Energy Engn, Tempe, AZ 85281 USA
[2] Sandia Natl Labs, Albuquerque, NM 87185 USA
[3] Sandia Natl Labs, Livermore, CA 94550 USA
[4] Univ Michigan, Mat Sci Dept, Ann Arbor, MI 48109 USA
关键词
Electrochemical random-access memory (ECRAM); heavy ion irradiation; mobility; neuromorphic computing; nonvolatile memory; vacancies; RADIATION; TAOX;
D O I
10.1109/TNS.2024.3360409
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Electrochemical random-access memory (ECRAM) is an emerging nonvolatile memory device which is promising for analog in-memory computing applications. Displacement damage in WO3-x ECRAM was experimentally characterized for the first time using a 1 MeV Au beam. At moderate levels of displacement damage (below fluence of similar to 10(11) cm(-2)), metal oxide ECRAM does not exhibit significant change, demonstrating the suitability of ECRAM for applications such as spaceborne computing. At high fluences (10(11) cm(-2)), where high concentrations of oxygen vacancies are created, channel conductivity was found to increase linearly with increasing vacancy concentration. A model of vacancy concentration versus conductivity allows the extraction of the mobility and initial doping concentration.
引用
收藏
页码:579 / 584
页数:6
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