Operational Verification of Gate Drive Circuit With Condition Monitoring Function for Gate Oxide Degradation of SiC MOSFETs

被引:4
作者
Hayashi, Shin-Ichiro [1 ]
Wada, Keiji [2 ]
机构
[1] Chiba Inst Technol, Dept Elect & Elect Engn, Chiba 2750016, Japan
[2] Tokyo Metropolitan Univ, Dept Elect Engn & Comp Sci, Tokyo 1920397, Japan
来源
IEEE OPEN JOURNAL OF POWER ELECTRONICS | 2024年 / 5卷
关键词
Condition monitoring; gate drive circuit; gate oxide; long-term reliability; SiC MOSFET; POWER; MODULES; RELIABILITY; STRESS; DESIGN; SYSTEM;
D O I
10.1109/OJPEL.2024.3396839
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper proposes a gate drive circuit with a condition monitoring function for detecting the gate oxide degradation in silicon carbide (SiC) metal-oxide-semiconductor field-effect transistors (MOSFETs). Trapped charges in the gate oxide can cause fluctuations in the on-resistance and gate threshold voltages. These phenomena affect the long-term reliability of power conversion circuits. The proposed condition monitoring function detects the degradation of the gate oxide by measuring the input capacitance C-iss versus the gate-source voltage v(GS) characteristics (C-iss-v(GS) characteristics) of SiC MOSFETs implemented in power conversion circuits. Experiments on the proposed gate drive circuit were conducted using a 400 W-rated buck converter circuit in which a SiC MOSFET is implemented. The experimental results show that the gate drive circuit is capable of online measurement of C-iss-v(GS) characteristics and gate drive at 20 kHz. The online measurement of the C-iss-v(GS) characteristics corresponds to the offline measurement with a measurement instrument, indicating the effectiveness of the gate drive circuit.
引用
收藏
页码:709 / 717
页数:9
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