InGaAs quantum dot chains grown by twofold selective area molecular beam epitaxy

被引:1
|
作者
Barbot, Clement [1 ]
Rondeau-Body, Claire [1 ]
Coinon, Christophe [1 ]
Deblock, Yves [1 ]
Tilmant, Pascal [1 ]
Vaurette, Francois [1 ]
Yarekha, Dmitri [1 ]
Berthe, Maxime [1 ]
Thomas, Louis [1 ]
Diesinger, Heinrich [1 ]
Capiod, Pierre [1 ]
Desplanque, Ludovic [1 ]
Grandidier, Bruno [1 ]
机构
[1] Univ Lille, Univ Polytech Hauts France, CNRS, Cent Lille,Junia ISEN,UMR 8520,IEMN, F-59000 Lille, France
关键词
selective area epitaxy; semiconductor nanowire; quantum dot chain; WORK FUNCTION;
D O I
10.1088/1361-6528/ad5f34
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Increasing quantum confinement in semiconductor quantum dot (QD) systems is essential to perform robust simulations of many-body physics. By combining molecular beam epitaxy and lithographic techniques, we developed an approach consisting of a twofold selective area growth to build QD chains. Starting from 15 nm-thick and 65 nm-wide in-plane In0.53Ga0.47As nanowires on InP substrates, linear arrays of In0.53Ga0.47As QDs were grown on top, with tunable lengths and separations. Kelvin probe force microscopy performed at room temperature revealed a change of quantum confinement in chains with decreasing QD sizes, which was further emphasized by the spectral shift of quantum levels resolved in the conduction band with low temperature scanning tunneling spectroscopy. This approach, which allows the controlled formation of 25 nm-thick QDs with a minimum length and separation of 30 nm and 22 nm respectively, is suitable for the construction of scalable fermionic quantum lattices.
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页数:6
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