Characterization of polyamide thin films by atomic force microscopy

被引:1
|
作者
McIntee, Olivia M. [1 ]
Sreedhar, Nurshaun [2 ,3 ]
Welch, Brian C. [4 ]
Bright, Victor M. [1 ]
Roy, Abhishek [2 ]
Paul, Mou [2 ]
Greenberg, Alan R. [1 ]
机构
[1] Univ Colorado, Dept Mech Engn, Boulder, CO 80309 USA
[2] Natl Renewable Energy Lab, Golden, CO 80401 USA
[3] Univ Texas Austin, Dept Civil Architectural & Environm Engn, Austin, TX USA
[4] Technion Israel Inst Technol, Dept Chem Engn, IL-3200003 Haifa, Israel
基金
美国国家科学基金会;
关键词
Polyamide thin films; Molecular layer deposition; Interfacial polymerization; Atomic force microscopy; Elastic modulus; Surface roughness; REVERSE-OSMOSIS MEMBRANES; ULTRATHIN POLYMER-FILMS; FREE CHLORINE-KINETICS; COMPOSITE MEMBRANES; MECHANICAL-PROPERTIES; ELASTIC-MODULUS; BARRIER LAYERS; ACTIVE LAYERS; YOUNGS MODULUS; WATER;
D O I
10.1016/j.polymer.2024.127350
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
This study directly compares the mechanical behavior of novel molecular layer deposition (MLD) and analogous interfacial polymerization (IP) polyamide thin films in environments relevant to reverse osmosis (RO) membrane operation. The elastic modulus of the films was determined using atomic force microscopy (AFM) in dry, hydrated, and chlorinated states. Surface roughness characteristics were also obtained given their potential influence on AFM modulus measurements. The much smoother MLD films demonstrated a statistically higher modulus in all states as compared to their IP counterparts. The MLD films maintained a modulus -3X and -5X greater than that of IP films after hydration and chlorination, respectively. Such differences in behavior may be due to the higher density and correspondingly lower void content of the MLD films. Results from this study provide a rationale for future development of MLD for fabrication of polyamide films for incorporation in RO membranes.
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页数:11
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