Challenges and prospects of ammonothermal GaN crystal growth and substrate fabrication

被引:0
作者
Grabianska, K. [1 ]
Kucharski, R. [1 ]
Bockowski, M. [1 ,2 ]
机构
[1] PAS, Inst High Pressure Phys, Sokolowska 29-37, PL-01142 Warsaw, Poland
[2] Nagoya Univ, Inst Mat & Syst Sustainabil, Ctr Integrated Res Future Elect, C3-1 Furo Cho,Chikusa Ku, Nagoya, Aichi 4648603, Japan
来源
GALLIUM NITRIDE MATERIALS AND DEVICES XIX | 2024年 / 12886卷
关键词
Ammonothermal method; Bulk growth; Gallium nitride; Substrate; Crystallization;
D O I
10.1117/12.3000034
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Gallium nitride (GaN) crystals of the best structural quality are grown by ammonothermal method in a supercritical ammonia solution inside high pressure autoclaves. This lecture will focus on the basic ammonothermal growth. The growth mechanism in different crystallographic directions, growth morphology and structural quality of GaN crystals, will be discussed. Structural properties and shape of the seeds will be shown. The influence of the crystallization run parameters, the internal configuration of the autoclave and the structural quality of the obtained GaN will be discussed. The path from bulk crystal to finished substrate of GaN will be presented. All challenges and difficulties to grown bulk GaN from ammonothermal method will be demonstrated. Scenarios for the further development of bulk GaN crystallization will be presented.
引用
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页数:2
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