Time-resolved photoemission electron microscopy of semiconductor interfaces

被引:3
作者
Kosar, Sofiia [1 ,2 ]
Dani, Keshav M. [1 ]
机构
[1] Technol Grad Univ, Okinawa Inst Sci, Femtosecond Spect Unit, Onna, Okinawa 9040495, Japan
[2] King Abdullah Univ Sci & Technol KAUST, KAUST Solar Ctr KSC, Phys Sci & Engn Div PSE, Thuwal 239556900, Saudi Arabia
基金
日本学术振兴会;
关键词
Photoemission electron microscopy; Time-resolved photoemission electron microscopy; Semiconductor interfaces; Nanoscale resolution; Ultrafast dynamics; CARRIER DIFFUSION; EXCITON DYNAMICS; ULTRAFAST; SURFACE; STATES; PHOTOLUMINESCENCE; GRAPHENE; LIFETIME; DAMAGE; NANOWIRES;
D O I
10.1016/j.progsurf.2024.100745
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Semiconductor interfaces are at the heart of the functionality of many devices for opto-electronic applications. At these interfaces, the importance of ultrafast dynamics - processes that occur on sub-nanosecond timescales - has been long understood. While these ultrafast spectroscopic studies have revealed important information, there remains a rich array of physics that is hidden within sub-micrometer length scales when using spatially-averaged techniques. However, powerful tools that could access material dynamics in semiconductors simultaneously at ultrafast time- and sub-micrometer length scales are challenging to implement. Here, we review recent developments in time-resolved photoemission electron microscopy as a technique to study ultrafast electron dynamics at semiconductor interfaces at the nanoscale. In particular, we review recent work in traditional semiconductor interfaces and heterojunctions, low-dimensional materials, and semiconductors for photovoltaic applications.
引用
收藏
页数:26
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