Nanoskiving of van der Waals Materials toward Edge/Basal Plane Contact Heterojunctions for High-Performance Photodetection

被引:3
作者
Li, Zihan [1 ,2 ]
Yan, Yongda [1 ,2 ]
Xu, Cheng Yan [1 ,3 ,4 ]
Li, Yang [1 ,3 ]
Geng, Yanquan [1 ,2 ]
机构
[1] Harbin Inst Technol, Minist Educ, Key Lab Microsyst & Microstruct Mfg, Harbin 150001, Heilongjiang, Peoples R China
[2] Harbin Inst Technol, Ctr Precis Engn, Harbin 150001, Heilongjiang, Peoples R China
[3] Harbin Inst Technol, Sch Mat Sci & Engn, Harbin 150001, Peoples R China
[4] Harbin Inst Technol Shenzhen, Sch Mat Sci & Engn, Sauvage Lab Smart Mat, Shenzhen 518055, Peoples R China
基金
中国国家自然科学基金;
关键词
black phosphorus; van der Waals heterostructures; edge/basal plane contact; nanoskiving; optoelectronicperformance; ULTRAFAST; MOS2; RES2;
D O I
10.1021/acsami.4c03196
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The unique features of edges in van der Waals materials may lead to edge-basal plane contacts that could provide new opportunities for electronic and optoelectronic devices. However, few studies have addressed edge/basal plane contact heterojunctions owing to the formidable challenges in integrating edges with the basal plane to form a heterojunction. Here, taking the example of black phosphorus (BP)/ReS2, a heterojunction with contact between the edge and the basal plane was successfully achieved by the introduction of a nanoskiving technique to fabricate BP edges with controlled orientation, followed by the dry transfer of a ReS2 flake. The deformation of BP during the nanoskiving process was clearly revealed, where interlayer slipping in the BP determined the formation of the edges. The edge/basal plane contact heterojunctions based on BP/ReS2 exhibited a reverse-rectifying behavior upon contact, and a high rectifying current was attributed to direct tunneling and Fowler-Nordheim tunneling in low and high bias regimes, respectively. As a photodetector, the heterojunction diode demonstrated an impressive responsivity of 65 A/W, a rapid response time (<10 ms), and polarization-sensitive detection under 532 nm illumination without gate biasing.
引用
收藏
页码:27640 / 27649
页数:10
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