Femtosecond laser nanomachining of bulk fused silica

被引：1

作者：

Barbato, Pasquale ^{[1
,2
]}

Osellame, Roberto ^{[1
]}

Vazquez, Rebeca Martinez ^{[1
]}

机构：

[1] Natl Res Council CNR, Inst Photon & Nanotechnol, Piazza Leonardo Da Vinci 32, I-20133 Milan, Italy

[2] Politecn Milan, Dept Phys, Piazza Leonardo Da Vinci 32, I-20133 Milan, Italy

来源：

FRONTIERS IN ULTRAFAST OPTICS:BIOMEDICAL, SCIENTIFIC, AND INDUSTRIAL APPLICATIONS XXIV | 2024年 / 12875卷

关键词：

Femtosecond laser irradiation followed by chemical etching; ultrafast laser material processing; transparent material nanomachining; fused silica nanostructuring; nanochannels;

D O I：

10.1117/12.3000923

中图分类号：

R318 [生物医学工程];

学科分类号：

0831 ;

摘要：

Femtosecond laser irradiation followed by chemical etching in NaOH is a material processing technique capable of creating hollow channels with submicrometric cross-sections, extending up to a millimeter in length. In this study, we unveil the fabrication conditions leading to an effective nano-structuring of bulk fused silica, overcoming the limitations of traditional machining techniques in terms of both minimum achievable dimensions and high aspect ratios.

引用

页数：5

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