Femtosecond laser nanomachining of bulk fused silica

被引：1
|
作者：
Barbato, Pasquale [1 ,2 ]
Osellame, Roberto [1 ]
Vazquez, Rebeca Martinez [1 ]
机构：
[1] Natl Res Council CNR, Inst Photon & Nanotechnol, Piazza Leonardo Da Vinci 32, I-20133 Milan, Italy
[2] Politecn Milan, Dept Phys, Piazza Leonardo Da Vinci 32, I-20133 Milan, Italy
来源：
FRONTIERS IN ULTRAFAST OPTICS:BIOMEDICAL, SCIENTIFIC, AND INDUSTRIAL APPLICATIONS XXIV | 2024年 / 12875卷
关键词：
Femtosecond laser irradiation followed by chemical etching; ultrafast laser material processing; transparent material nanomachining; fused silica nanostructuring; nanochannels;
D O I：
10.1117/12.3000923
中图分类号：
R318 [生物医学工程];
学科分类号：
0831 ;
摘要：
Femtosecond laser irradiation followed by chemical etching in NaOH is a material processing technique capable of creating hollow channels with submicrometric cross-sections, extending up to a millimeter in length. In this study, we unveil the fabrication conditions leading to an effective nano-structuring of bulk fused silica, overcoming the limitations of traditional machining techniques in terms of both minimum achievable dimensions and high aspect ratios.
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页数：5
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