Coupling surface plasmon resonance (SPR) sensing with electrochemistry (EC) is a promising analytical strategy to obtain information about interfacial phenomena in heterogeneous reactions. Typical EC-SPR sensors utilize a metal film both as the plasmonic material and as the working electrode. In this configuration, the eigenmodulation of the plasmonic properties of the metal film under applied potential results in a background signal, which hampers the unambiguous interpretation of the sensor response due to redox reactions. Here, a new strategy is presented to overcome this disadvantage by using a van der Waals heterostructure (vdW-HS) as the working electrode. The vdW-HS comprises of a graphene / hexagonal boron nitride (hBN) stack on a gold film of a standard SPR sensor. It is shown here that the background signal is completely suppressed enabling the unambiguous analysis of SPR sensor response due to electrochemical reactions. It is further observed that the potential dependent plasmonic signals are not just a reproduction of the electrochemical current and subtle differences can be traced back to the diffusive nature of the redox active species. Finally, it is demonstrated that EC-SPR can be used as a complementary method to distinguish if the electrochemical response is mainly surface-bound or due to diffusion. Here a new strategy is presented to realize an electrochemical surface plasmon resonance (EC-SPR) sensor using a graphene/hexagonal boron nitride heterostructure on gold. With this sensor, it is shown that the potential-dependent modulation of the EC-SPR signal on gold can be completely suppressed, enabling unambiguous monitoring of redox reactions at the graphene-liquid-interface. image
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UNIST, Low Dimens Carbon Mat Ctr, Perovtron Res Ctr, Dept Energy Engn,Sch Energy & Chem Engn, Ulsan 44919, South KoreaUNIST, Low Dimens Carbon Mat Ctr, Perovtron Res Ctr, Dept Energy Engn,Sch Energy & Chem Engn, Ulsan 44919, South Korea
Seo, Jihyung
Lee, Junghyun
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UNIST, Low Dimens Carbon Mat Ctr, Perovtron Res Ctr, Dept Energy Engn,Sch Energy & Chem Engn, Ulsan 44919, South KoreaUNIST, Low Dimens Carbon Mat Ctr, Perovtron Res Ctr, Dept Energy Engn,Sch Energy & Chem Engn, Ulsan 44919, South Korea
Lee, Junghyun
Kim, Yongchul
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UNIST, Dept Chem, Ulsan 44919, South KoreaUNIST, Low Dimens Carbon Mat Ctr, Perovtron Res Ctr, Dept Energy Engn,Sch Energy & Chem Engn, Ulsan 44919, South Korea
Kim, Yongchul
Koo, Donghwan
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UNIST, Low Dimens Carbon Mat Ctr, Perovtron Res Ctr, Dept Energy Engn,Sch Energy & Chem Engn, Ulsan 44919, South KoreaUNIST, Low Dimens Carbon Mat Ctr, Perovtron Res Ctr, Dept Energy Engn,Sch Energy & Chem Engn, Ulsan 44919, South Korea
Koo, Donghwan
Lee, Geunsik
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UNIST, Dept Chem, Ulsan 44919, South KoreaUNIST, Low Dimens Carbon Mat Ctr, Perovtron Res Ctr, Dept Energy Engn,Sch Energy & Chem Engn, Ulsan 44919, South Korea
Lee, Geunsik
Park, Hyesung
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UNIST, Low Dimens Carbon Mat Ctr, Perovtron Res Ctr, Dept Energy Engn,Sch Energy & Chem Engn, Ulsan 44919, South KoreaUNIST, Low Dimens Carbon Mat Ctr, Perovtron Res Ctr, Dept Energy Engn,Sch Energy & Chem Engn, Ulsan 44919, South Korea
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Tata Inst Fundamental Res, Hyderabad 500046, IndiaTata Inst Fundamental Res, Hyderabad 500046, India
Figerez, Stelbin Peter
Tadi, Kiran Kumar
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Tata Inst Fundamental Res, Hyderabad 500046, India
Vellore Inst Technol VIT, Div Healthcare Adv Innovat & Res, Chennai 600127, Tamil Nadu, IndiaTata Inst Fundamental Res, Hyderabad 500046, India
Tadi, Kiran Kumar
Sahoo, Krishna Rani
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Tata Inst Fundamental Res, Hyderabad 500046, IndiaTata Inst Fundamental Res, Hyderabad 500046, India
Sahoo, Krishna Rani
Sharma, Rahul
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Tata Inst Fundamental Res, Hyderabad 500046, IndiaTata Inst Fundamental Res, Hyderabad 500046, India
Sharma, Rahul
Biroju, Ravi K.
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Tata Inst Fundamental Res, Hyderabad 500046, IndiaTata Inst Fundamental Res, Hyderabad 500046, India
Biroju, Ravi K.
Gigi, Aleena
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Tata Inst Fundamental Res, Hyderabad 500046, IndiaTata Inst Fundamental Res, Hyderabad 500046, India
Gigi, Aleena
Anand, K. Aiswarya
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Tata Inst Fundamental Res, Hyderabad 500046, IndiaTata Inst Fundamental Res, Hyderabad 500046, India
Anand, K. Aiswarya
Kalita, Golap
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Nagoya Inst Technol, Dept Phys Sci & Engn, Nagoya, Aichi 4668555, JapanTata Inst Fundamental Res, Hyderabad 500046, India
Kalita, Golap
Narayanan, Tharangattu N.
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Tata Inst Fundamental Res, Hyderabad 500046, IndiaTata Inst Fundamental Res, Hyderabad 500046, India