Built-in electric field in NiO-CuO heterostructures to regulate the hydroxide adsorption sites for 5-hydroxymethylfurfural electrooxidation assisted hydrogen production

被引:9
|
作者
Zhu, Yumei [1 ]
Wei, Jinlv [1 ]
Wu, Jia [1 ]
Chen, Rong [1 ]
Tsiakaras, Panagiotis [2 ]
Yin, Shibin [1 ]
机构
[1] Guangxi Univ, Sch Chem & Chem Engn, Guangxi Key Lab Electrochem Energy Mat, Nanning 530004, Peoples R China
[2] Univ Thessaly, Sch Engn, Dept Mech Engn, Lab Alternat Energy Convers Syst, Volos 38834, Greece
基金
中国国家自然科学基金;
关键词
Built-in electric field; Heterostructure; Adsorption behavior; 5-Hydroxymethylfurfural oxidation; Hydrogen evolution reaction; OXIDATION; VALORIZATION; PERFORMANCE; CATALYSTS; WATER; ACID; ZN;
D O I
10.1016/j.jcis.2024.05.216
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The development of catalysts with suitable adsorption behavior for the reaction molecules and the elucidation of their internal structure-adsorption-catalytic activity relationships are crucial for the electrooxidation of 5hydroxymethylfurfural (HMF). In this work, NiO-CuO heterostructures with a spontaneous built-in electric field (BEF) are specifically designed and used to regulate the OH- adsorption site for freeing up the active site of HMF for the HMF oxidation reaction (HMFOR). The mechanism driving electron pumping/accumulation of the BEF is examined by X-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS). Electrochemical data and theoretical calculations show that BEF modulates the adsorption energy and adsorption site of substrate molecules, thereby enhancing the performance of HMFOR and hydrogen evolution reaction (HER). Notably, the NiO-CuO electrode demonstrates high 2,5-Furandicarboxylic acid (FDCA) selectivity (99.76 %) and generation rate (13.79 mmol gcat- 1 h-1). It only requires 1.33 V to obtain a current density of 10 mA cm-2 for HMFOR-coupled H2 evolution. This research introduces a novel approach by regulating the adsorption of reactive molecules for HMFOR-assisted H2 evolution.
引用
收藏
页码:301 / 311
页数:11
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