Surface Profiling of Silicon Wafer Using Wavelength-Scanning Fizeau Interferometer and Gaussian Window Function

被引:1
作者
Bae, Juncheol [1 ]
Kim, Hwan [1 ]
Jeon, Jurim [1 ]
Kim, Yangjin [1 ]
机构
[1] Pusan Natl Univ, Sch Mech Engn, Busan, South Korea
关键词
Characteristic Polynomial; Fizeau Interferometry(Fizeau; Gaussian Window; Function(Gaussian); Silicon Wafer; Surface Profiling; Wavelength-Scanning Interferometry; OPTICAL-THICKNESS; PHASE; ALGORITHMS; DESIGN; SHAPE;
D O I
10.3795/KSME-A.2024.48.7.455
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
: Wavelength-scanning Fizeau interferometry is extensively utilized for measuring surface shapes. The phase distribution in a fringe pattern can be determined using a phase-shifting algorithm. Surrel's characteristic polynomial theory allows for the design of flexible phase-shifting algorithms by modifying the window function. As industry demands for higher measurement precision increase, the need to develop flexible phase-shifting algorithms with improved phase-shift error suppression has been increasing. Nevertheless, devising these algorithms poses significant challenges, primarily due to the complex derivation of their window functions, which are formulated as powers of M-sample characteristic polynomials. In this study, the Gaussian window function was developed by generalizing existing flexible phase-shifting algorithms. Ultimately, a 4-inch silicon wafer's surface shape was measured via a wavelength-scanning Fizeau interferometer employing the 10N - 9 algorithms, which are calculated by Gaussian phase-shifting algorithm.
引用
收藏
页码:455 / 465
页数:11
相关论文
共 25 条
[21]   Influence of silicon wafer surface roughness on semiconductor device characteristics [J].
Mori, Keiichiro ;
Samata, Shuichi ;
Mitsugi, Noritomo ;
Teramoto, Akinobu ;
Kuroda, Rihito ;
Suwa, Tomoyuki ;
Hashimoto, Keiichi ;
Sugawa, Shigetoshi .
JAPANESE JOURNAL OF APPLIED PHYSICS, 2020, 59
[22]   A Review of Thickness Measurements of Thick Transparent Layers Using Optical Interferometry [J].
Park, Jungjae ;
Kim, Jong-Ahn ;
Ahn, Heulbi ;
Bae, Jaeseok ;
Jin, Jonghan .
INTERNATIONAL JOURNAL OF PRECISION ENGINEERING AND MANUFACTURING, 2019, 20 (03) :463-477
[23]   DIGITAL WAVE-FRONT MEASURING INTERFEROMETRY - SOME SYSTEMATIC-ERROR SOURCES [J].
SCHWIDER, J ;
BUROW, R ;
ELSSNER, KE ;
GRZANNA, J ;
SPOLACZYK, R ;
MERKEL, K .
APPLIED OPTICS, 1983, 22 (21) :3421-3432
[24]   Design of algorithms for phase measurements by the use of phase stepping [J].
Surrel, Y .
APPLIED OPTICS, 1996, 35 (01) :51-60
[25]   PHASE-SHIFTING - 6-SAMPLE SELF-CALIBRATING ALGORITHM INSENSITIVE TO THE 2ND-HARMONIC IN THE FRINGE SIGNAL [J].
ZHAO, B ;
SURREL, Y .
OPTICAL ENGINEERING, 1995, 34 (09) :2821-2822