Surface Profiling of Silicon Wafer Using Wavelength-Scanning Fizeau Interferometer and Gaussian Window Function

被引:1
作者
Bae, Juncheol [1 ]
Kim, Hwan [1 ]
Jeon, Jurim [1 ]
Kim, Yangjin [1 ]
机构
[1] Pusan Natl Univ, Sch Mech Engn, Busan, South Korea
关键词
Characteristic Polynomial; Fizeau Interferometry(Fizeau; Gaussian Window; Function(Gaussian); Silicon Wafer; Surface Profiling; Wavelength-Scanning Interferometry; OPTICAL-THICKNESS; PHASE; ALGORITHMS; DESIGN; SHAPE;
D O I
10.3795/KSME-A.2024.48.7.455
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
: Wavelength-scanning Fizeau interferometry is extensively utilized for measuring surface shapes. The phase distribution in a fringe pattern can be determined using a phase-shifting algorithm. Surrel's characteristic polynomial theory allows for the design of flexible phase-shifting algorithms by modifying the window function. As industry demands for higher measurement precision increase, the need to develop flexible phase-shifting algorithms with improved phase-shift error suppression has been increasing. Nevertheless, devising these algorithms poses significant challenges, primarily due to the complex derivation of their window functions, which are formulated as powers of M-sample characteristic polynomials. In this study, the Gaussian window function was developed by generalizing existing flexible phase-shifting algorithms. Ultimately, a 4-inch silicon wafer's surface shape was measured via a wavelength-scanning Fizeau interferometer employing the 10N - 9 algorithms, which are calculated by Gaussian phase-shifting algorithm.
引用
收藏
页码:455 / 465
页数:11
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