Effect of hydrogen treatment on 4H-SiC Schottky barrier diodes

被引:0
|
作者
Chen, Zihe [1 ]
Liu, Ling [1 ]
Sun, Yunlong [1 ]
Li, Gang [1 ]
Yan, Shaoan [2 ]
Xiao, Yongguang [1 ]
Tang, Minghua [1 ]
Li, Zheng [3 ]
机构
[1] Xiangtan Univ, Sch Mat Sci & Engn, Xiangtan 411105, Peoples R China
[2] Xiangtan Univ, Sch Mech Engn, Xiangtan 411105, Peoples R China
[3] Ludong Univ, Yantai 264025, Peoples R China
基金
中国国家自然科学基金;
关键词
4H-SiC; Schottky barrier diodes (SBDs); hydrogen treatment; interface state density; hydrogen diffusion; SILICON-CARBIDE; PASSIVATION; DEGRADATION; ACCEPTORS; TRANSPORT; DESIGN;
D O I
10.1088/1402-4896/ad6220
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
In this letter, 4H-SiC Schottky barrier diodes (SBDs) with Ti Schottky metal have been subjected to hydrogen treatment in a confined environment of 4% H2 and 96% N2 at 150 degrees C. The effect of hydrogen treatment on the SBDs electrical characteristics has been investigated by technical computer-aided design simulation (TCAD) and power device analyzer curve tracer. The change of electrical parameters of SBDs measured after hydrogen treatment is studied in detail, and the related degradation mechanism is discussed. It was found that hydrogen treatment affected both the interface region and bulk region of SiC SBDs. After hydrogen treatment, the Schottky barrier increases slightly, the ideal factor (n) decreases slightly, and the interfacial state density (D it) decreases. Hydrogen treatment resulted in a slight reduction in specific on-resistance (R on-sp), which was attributed to the diffusion of H in SBDs. Through TCAD simulation, it is determined that the diffusion of H in the body diode of SBDs is the main reason for the degradation of high forward current and high reverse voltage characteristics.
引用
收藏
页数:9
相关论文
共 50 条
  • [1] Barrier Inhomogeneities of Mo Schottky Barrier Diodes on 4H-SiC
    Naretto, M.
    Perrone, D.
    Ferrero, S.
    Scaltrito, L.
    SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2, 2010, 645-648 : 227 - +
  • [2] Alphavoltaic Performance of 4H-SiC Schottky Barrier Diodes
    Shilpa, A.
    Murty, N. V. L. Narasimha
    IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 2024, 71 (12) : 2507 - 2514
  • [3] Barrier inhomogeneities of tungsten Schottky diodes on 4H-SiC
    Hamida, A. Ferhat
    Ouennoughi, Z.
    Sellai, A.
    Weiss, R.
    Ryssel, H.
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2008, 23 (04)
  • [4] Improvements in the reverse characteristics of 4H-SiC Schottky barrier diodes by hydrogen treatments
    Kim, DH
    Na, HJ
    Jung, SY
    Song, IB
    Um, MY
    Song, HK
    Jeong, JK
    Lee, JB
    Kim, HJ
    SILICON CARBIDE AND RELATED MATERIALS 2003, PTS 1 AND 2, 2004, 457-460 : 1001 - 1004
  • [5] Properties of homoepitaxial 4H-SiC and characteristics of Ti/4H-SiC Schottky barrier diodes
    Chen, G.
    Li, Z. Y.
    Bai, S.
    Han, P.
    THIN FILM PHYSICS AND APPLICATIONS, SIXTH INTERNATIONAL CONFERENCE, 2008, 6984
  • [6] Junction barrier Schottky diodes in 4H-SiC and 6H-SiC
    Dahlquist, F
    Zetterling, CM
    Ostling, M
    Rottner, K
    SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2, 1998, 264-2 : 1061 - 1064
  • [7] Junction Barrier Schottky diodes in 4H-SiC and 6H-SiC
    Royal Inst of Technology, Kista, Sweden
    Mater Sci Forum, pt 2 (1061-1064):
  • [8] Effect of surface passivation on breakdown voltages of 4H-SiC Schottky barrier diodes
    In Ho Kang
    Moon Kyong Na
    Ogyun Seok
    Jeong Hyun Moon
    H. W. Kim
    Sang Cheol Kim
    Wook Bahng
    Nam Kyun Kim
    Him-Chan Park
    Chang Heon Yang
    Journal of the Korean Physical Society, 2017, 71 : 707 - 710
  • [9] Effect of surface passivation on breakdown voltages of 4H-SiC Schottky barrier diodes
    Kang, In Ho
    Na, Moon Kyong
    Seok, Ogyun
    Moon, Jeong Hyun
    Kim, H. W.
    Kim, Sang Cheol
    Bahng, Wook
    Kim, Nam Kyun
    Park, Him-Chan
    Yang, Chang Heon
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2017, 71 (10) : 707 - 710
  • [10] Effect of plasma etching and sacrificial oxidation on 4H-SiC Schottky barrier diodes
    Morrison, DJ
    Pidduck, AJ
    Moore, V
    Wilding, PJ
    Hilton, KP
    Uren, MJ
    Johnson, CM
    SILICON CARBIDE AND RELATED MATERIALS - 1999 PTS, 1 & 2, 2000, 338-3 : 1199 - 1202