Multilevel resistive switching in hydrothermally synthesized FeWO4 thin film-based memristive device for non-volatile memory application

被引:3
作者
Patil, Amitkumar R. [1 ]
Dongale, Tukaram D. [2 ]
Pedanekar, Rupesh S. [1 ]
Sutar, Santosh S. [3 ]
Kamat, Rajanish K. [4 ,5 ]
Rajpure, Keshav Y. [1 ]
机构
[1] Shivaji Univ, Dept Phys, Electrochem Mat Lab, Kolhapur 416004, India
[2] Shivaji Univ, Sch Nanosci & Biotechnol, Computat Elect & Nanosci Res Lab, Kolhapur 416004, India
[3] Shivaji Univ, Yashwantrao Chavan Sch Rural Dev, Kolhapur 416004, India
[4] Shivaji Univ, Dept Elect, Kolhapur 416004, Maharashtra, India
[5] Dr Homi Bhabha State Univ, Inst Sci, 15 Madam Cama Rd, Mumbai 400032, India
关键词
FeWO4; Hydrothermal; Rietveld refinement; Resistive switching; Non-volatile memory; MECHANISMS; POWER;
D O I
10.1016/j.jcis.2024.04.222
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The memristors offer significant advantages as a key element in non-volatile and brain -inspired neuromorphic systems because of their salient features such as remarkable endurance, ability to store multiple bits, fast operation speed, and extremely low energy usage . This work reports the resistive switching (RS) characteristics of the hydrothermally synthesized iron tungstate (FeWO 4 ) based thin film memristive device. The detailed physicochemical analysis was investigated using Rietveld ' s refinement, X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscopy (FE-SEM), and transmission electron microscopy (TEM) techniques. The fabricated Ag/FWO/FTO memristive device exhibits bipolar resistive switching (BRS) behavior. In addition, the devices exhibit negative differential resistance (NDR) at both positive and negative bias. The charge -flux relation portrayed the non -ideal or memristive nature of the devices. The reliability in the RS process was analyzed in detail using Weibull distribution and time series analysis techniques. The device exhibits stable and multilevel endurance and retention characteristics which demonstrates the suitability of the device for the highdensity non-volatile memory application. The current conduction of the device was dominated by Ohmic and trap controlled -space charge limited current (TC-SCLC) mechanisms and filamentary RS process responsible for the BRS in the device. In a nutshell, the present investigations reveal the potential use of the iron tungstate for the fabrication of memristive devices for the non-volatile memory application.
引用
收藏
页码:444 / 457
页数:14
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