Understanding vapor phase growth of hexagonal boron nitride

被引:0
|
作者
Sutorius, Anja [1 ]
Weissing, Rene [1 ]
Perez, Carina Rindtorff [1 ]
Fischer, Thomas [1 ]
Hartl, Fabian [1 ]
Basu, Nilanjan [2 ]
Shin, Hyeon Suk [2 ,3 ]
Mathur, Sanjay [1 ]
机构
[1] Univ Cologne, Inst Inorgan & Mat Chem, Dept Chem, Greinstr 6, D-50939 Cologne, Germany
[2] Sungkyunkwan Univ SKKU, Inst Basic Sci IBS, Ctr Quantum Heterostruct 2D, Suwon 16419, South Korea
[3] Sungkyunkwan Univ SKKU, Dept Energy Sci, Suwon 16419, South Korea
关键词
DEPOSITION GROWTH; THIN-FILMS; MONOLAYER; AMMONIA; CRYSTALLINE; PRESSURE; GRAPHENE; BN;
D O I
10.1039/d4nr02624a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Hexagonal boron nitride (hBN), with its atomically flat structure, excellent chemical stability, and large band gap energy (similar to 6 eV), serves as an exemplary 2D insulator in electronics. Additionally, it offers exceptional attributes for the growth and encapsulation of semiconductor transition metal dichalcogenides (TMDCs). Current methodologies for producing hBN thin films primarily involve exfoliating multi-layer or bulk crystals and thin film growth via chemical vapor deposition (CVD), which entails the thermal decomposition and surface reaction of molecular precursors like ammonia boranes (NH3BH3) and borazine (B3N3H6). These molecular precursors contain pre-existing B-N bonds, thus promoting the nucleation of BN. However, the quality and phase purity of resulting BN films are greatly influenced by the film preparation and deposition process conditions that remain a substantial concern. This study aims to comprehensively investigate the impact of varied CVD systems, parameters, and precursor chemistry on the synthesis of high-quality, large scale hBN on both catalytic and non-catalytic substrates. The comparative analysis provided new insights into most effective approaches concerning both quality and scalability of vapor phase grown hBN films. High-quality grown hexagonal boron nitride by chemical vapor deposition using ammonia borane and borazine on (non-)catalytic substrates.
引用
收藏
页码:15782 / 15792
页数:11
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