EUV optics at ZEISS: status, outlook, and future

被引:2
|
作者
Kalden, Joachim [1 ]
Neumann, Jens Timo [1 ]
Juergens, Dirk [1 ]
Graeupner, Paul [1 ]
Seitz, Wolfgang [1 ]
Kuerz, Peter [1 ]
机构
[1] Carl Zeiss SMT GmbH, Rudolf Eber Str 2, D-73447 Oberkochen, Germany
来源
OPTICAL AND EUV NANOLITHOGRAPHY XXXVII | 2024年 / 12953卷
基金
欧盟地平线“2020”;
关键词
EUV; optics; imaging; lithography; High-NA;
D O I
10.1117/12.3010847
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
With the first delivery from ASML to Intel end of 2023, the next generation of EUV systems with ZEISS optics has found its way to the first high-end chip manufacturer. The increased numerical aperture (NA) of 0.55 compared to state-of-the-art EUV optics with a NA of 0.33, the new generation of NA=0.55 EUV scanners allow to support Moore's law for at least another decade. Besides the new NA=0.55 EUV systems, ZEISS and ASML also continuously improve the current EUV scanners by enabling higher throughputs combined with improved imaging performance. We will present an overview over the status and key facts of the new NA=0.55 EUV optics as well as the latest performance improvements achieved for EUV systems with NA of 0.33. Furthermore, we will provide a glance at the EUV optics roadmap and provide give an outlook on what can be expected for EUV optics in future.
引用
收藏
页数:6
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