Sputtering yields of TiC and MAX phase Ti2AlC using Ne, Ar, Xe ions

被引:2
作者
Kovtun, Yu. V. [1 ]
Kuprin, A. S. [1 ]
Podhurska, V. Ya. [2 ]
机构
[1] Natl Sci Ctr Kharkiv Inst Phys & Technol, Kharkiv, Ukraine
[2] NAS Ukraine, Karpenko Physico Mech Inst, Lvov, Ukraine
关键词
Sputtering yield; Sputtering threshold energy; Compounds solid targets; Ion; Noble gas; ACCURATE SEMIEMPIRICAL EQUATION; LASER-INDUCED FLUORESCENCE; MONTE-CARLO-SIMULATION; ENERGY-DEPENDENCE; COMPUTER-SIMULATION; EMPIRICAL-FORMULA; MONATOMIC SOLIDS; THIN-FILMS; DEPOSITION; ATOMS;
D O I
10.1016/j.nimb.2024.165433
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Information on sputtering coefficients of materials is necessary for coating deposition technologies and studying the interaction of ion beams and plasma with the surface. This paper summarizes experimental data on sputtering coefficients of TiC and MAX phase Ti 2 AlC by noble gas ions Ne, Ar, and Xe. The sputtering coefficients of TiC and MAX phase Ti 2 AlC were calculated using a semi-empirical model. A comparison of the experimental and calculated data showed satisfactory agreement.
引用
收藏
页数:7
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