Photopolymerization initiated by p-diethylene glycol monomethyl ether cinnamyl formamide-based disulfide under 455 nm LED with minimized volume shrinkage

被引:0
作者
Zhang, Yuhan [2 ]
Xiao, Nan [2 ]
Gao, Yanjing [2 ]
Sun, Fang [1 ,2 ,3 ]
机构
[1] Beijing Univ Chem Technol, State Key Lab Chem Resource Engn, Beijing 100029, Peoples R China
[2] Beijing Univ Chem Technol, Coll Chem, Beijing 100029, Peoples R China
[3] Beijing Univ Chem Technol, Anqing Res Inst, Anqing 246000, Peoples R China
基金
中国国家自然科学基金;
关键词
LED photopolymerization; Volume shrinkage; Photoinitiator; Disulfide bond; Cinnamyl formamide; STRESS;
D O I
10.1016/j.porgcoat.2024.108688
中图分类号
O69 [应用化学];
学科分类号
081704 ;
摘要
This study introduces a novel p-diethylene glycol monomethyl ether cinnamyl formamide-based disulfide monomer, N,N '-(disulfanediylbis(2,1-phenylene)) bis(4-(4-(2-(2-methoxyethoxy)ethoxy) phenyl)-2-oxobut-3enamide) (Mp-BSCF), designed to reduce the volume shrinkage of photosensitive resins and initiate monomer polymerization under 455 nm LED light irradiation. The photochemical properties and photoinitiation efficiency of Mp-BSCF are systematically investigated using UV-vis absorption spectroscopy, electron paramagnetic resonance (EPR) and real-time infrared spectroscopy. Although its weak absorption around 455 nm, Mp-BSCF can generate arylthiyl radicals under 455 nm LED irradiation, and then effectively initiate the polymerization of triethylene glycol dimethacrylate (TEGDMA)/A glycerolate dimethacrylate (Bis-GMA) system. Increasing MpBSCF addition enhances the final double bond conversion and maximum polymerization rate of the TEGDMA/ Bis-GMA system, reaching up to 82.0 % and 2.02 % s-1, respectively. Notably, Mp-BSCF significantly reduces the volume shrinkage of the photopolymerization system, with the addition of 10 % Mp-BSCF resulting in a 50 % reduction compared to the control system. This reduction is attributed to the dynamic reversible nature of the S-S bond "breaking-recovery" and the intermolecular hydrogen bond interaction. Additionally, Mp-BSCF improves the thermal stability, friction resistance, and hardness of the TEGDMA/Bis-GMA photopolymerization system.
引用
收藏
页数:9
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