Investigation of Fabrication Conditions for VO2 Thin Films by MOD using Carbon Thermal Reduction

被引：0
作者：
Fujishiro Y. [1 ]
Kawahara M. [2 ]
Samura T. [2 ]
Tachiki T. [1 ]
Uchida T. [1 ]
机构：
[1] National Defense Academy, 1-10-20, Hashirimizu, Yokosuka
[2] Kojundo Chemical Laboratory Co., Ltd., 5-1-28, Chiyoda, Sakado
来源：
IEEJ Transactions on Fundamentals and Materials | 2021年 / 141卷 / 01期
关键词：
Carbon thermal reduction; Metal-organic decomposition (MOD); Vanadium dioxide (VO[!sub]2[!/sub]);
D O I：
10.1541/ieejfms.141.64
中图分类号：
学科分类号：
摘要：
Vanadium dioxide (VO2) thin films were fabricated by metal-organic decomposition (MOD). To utilize a carbon thermal reduction for obtaining a VO2 composition, the precursor films were fabricated at the temperature Tp from 300 to 380 ºC in a N2 atmosphere. From the measurement results of XRD, diffraction peaks indicating VO2 phase were observed with a wide range of firing temperatures from Tf = 560 to 620 ºC. Furthermore, the peaks indicating VO2 phase were also observed with a wide range of firing time from tf = 15-45 min. Regarding the surface morphology of the films, the nanoparticles of 100-200 nm were densely packed although small spaces existed between the particles. The R-T characteristics of the films indicated the phase transition with a rapid resistance change of about three orders of magnitude and hysteresis loop. From these experimental results, it was found that wide windows of firing conditions for fabricating VO2 thin film can be obtained in the MOD process using the carbon thermal reduction. © 2021 The Institute of Electrical Engineers of Japan.
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页码：64 / 68
页数：4
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