All-2D CVD-grown semiconductor field-effect transistors with van der Waals graphene contacts

被引:6
|
作者
Hoque, Md. Anamul [1 ]
George, Antony [2 ]
Ramachandra, Vasudev [1 ]
Najafidehaghani, Emad [2 ]
Gan, Ziyang [2 ]
Mitra, Richa [1 ]
Zhao, Bing [1 ]
Sahoo, Satyaprakash [3 ,4 ]
Abrahamsson, Maria [5 ]
Liang, Qiuhua [6 ]
Wiktor, Julia [6 ]
Turchanin, Andrey [2 ]
Kubatkin, Sergey [1 ]
Lara-Avila, Samuel [1 ]
Dash, Saroj P. [1 ,7 ]
机构
[1] Chalmers Univ Technol, Dept Microtechnol & Nanosci, SE-41296 Gothenburg, Sweden
[2] Friedrich Schiller Univ Jena, Inst Phys Chem, D-07743 Jena, Germany
[3] Inst Phys, Lab Low Dimens Mat, Bhubaneswar 751005, India
[4] Homi Bhabha Natl Inst, Training Sch Complex, Mumbai 400094, India
[5] Chalmers Univ Technol, Dept Chem & Chem Engn, SE-41296 Gothenburg, Sweden
[6] Chalmers Univ Technol, Dept Phys, SE-41296 Gothenburg, Sweden
[7] Chalmers Univ Technol, Dept Microtechnol & Nanosci, Wallenberg Initiat Mat Sci Sustainabil, SE-41296 Gothenburg, Sweden
基金
瑞典研究理事会;
关键词
METAL-INSULATOR-TRANSITION; 2-DIMENSIONAL MATERIALS; MOS2; TRANSISTORS; HETEROSTRUCTURES;
D O I
10.1038/s41699-024-00489-2
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Two-dimensional (2D) semiconductors and van der Waals (vdW) heterostructures with graphene have generated enormous interest for future electronic, optoelectronic, and energy-harvesting applications. The electronic transport properties and correlations of such hybrid devices strongly depend on the quality of the materials via chemical vapor deposition (CVD) process, their interfaces and contact properties. However, detailed electronic transport and correlation properties of the 2D semiconductor field-effect transistor (FET) with vdW graphene contacts for understanding mobility limiting factors and metal-insulator transition properties are not explored. Here, we investigate electronic transport in scalable all-2D CVD-grown molybdenum disulfide (MoS2) FET with graphene contacts. The Fermi level of graphene can be readily tuned by a gate voltage to enable a nearly perfect band alignment and, hence, a reduced and tunable Schottky barrier at the contact with good field-effect channel mobility. Detailed temperature-dependent transport measurements show dominant phonon/impurity scattering as a mobility limiting mechanisms and a gate-and bias-induced metal-insulator transition in different temperature ranges, which is explained in light of the variable-range hopping transport. These studies in such scalable all-2D semiconductor heterostructure FETs will be useful for future electronic and optoelectronic devices for a broad range of applications.
引用
收藏
页数:7
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