Corrigendum to Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))

被引：0

作者：

Hsu, I-Ling ^{[1
]}

Yeh, Fang Hao ^{[2
]}

Chin, Yu-Cheng ^{[1
]}

Cheung, Chun In ^{[3
]}

Chia, Zi Chun ^{[1
]}

Yang, Li-Xing ^{[1
]}

Chen, Ya-Jyun ^{[1
]}

Cheng, Ting-Yu ^{[3
]}

Wu, Shu-Pao ^{[4
]}

Tsai, Pei-Jane ^{[2
,7
]}

Lee, Nan-Yao ^{[5
,6
]}

Liao, Mei-Yi ^{[8
]}

Huang, Chih-Chia ^{[1
,7
]}

机构：

[1] Department of Photonics, National Cheng Kung University, Tainan, Taiwan

[2] Department of Medical Laboratory Science and Biotechnology, National Cheng Kung University, Tainan, Taiwan

[3] Department of Chemistry, National Cheng Kung University, Tainan, Taiwan

[4] Department of Applied Chemistry, National Chiao Tung University, Hsinchu, Taiwan

[5] Department of Medicine, National Cheng Kung University, Tainan, Taiwan

[6] Division of Infectious Diseases, Department of Internal Medicine and Center for Infection Control, National Cheng Kung University Hospital, Tainan, Taiwan

[7] Center of Applied Nanomedicine and Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan, Taiwan

[8] Department of Applied Chemistry, National Pingtung University, Pingtung, Taiwan

来源：

Chemical Engineering Journal | 2022年 / 428卷

关键词：

Compendex;

D O I：

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摘要：

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