Corrigendum to Multiplex antibacterial processes and risk in resistant phenotype by high oxidation-state nanoparticles: New killing process and mechanism investigations [Chem. Eng. J. 409 (2021) 128266] (Chemical Engineering Journal (2021) 409, (S1385894720343783), (10.1016/j.cej.2020.128266))

被引:0
|
作者
Hsu, I-Ling [1 ]
Yeh, Fang Hao [2 ]
Chin, Yu-Cheng [1 ]
Cheung, Chun In [3 ]
Chia, Zi Chun [1 ]
Yang, Li-Xing [1 ]
Chen, Ya-Jyun [1 ]
Cheng, Ting-Yu [3 ]
Wu, Shu-Pao [4 ]
Tsai, Pei-Jane [2 ,7 ]
Lee, Nan-Yao [5 ,6 ]
Liao, Mei-Yi [8 ]
Huang, Chih-Chia [1 ,7 ]
机构
[1] Department of Photonics, National Cheng Kung University, Tainan, Taiwan
[2] Department of Medical Laboratory Science and Biotechnology, National Cheng Kung University, Tainan, Taiwan
[3] Department of Chemistry, National Cheng Kung University, Tainan, Taiwan
[4] Department of Applied Chemistry, National Chiao Tung University, Hsinchu, Taiwan
[5] Department of Medicine, National Cheng Kung University, Tainan, Taiwan
[6] Division of Infectious Diseases, Department of Internal Medicine and Center for Infection Control, National Cheng Kung University Hospital, Tainan, Taiwan
[7] Center of Applied Nanomedicine and Center for Micro/Nano Science and Technology, National Cheng Kung University, Tainan, Taiwan
[8] Department of Applied Chemistry, National Pingtung University, Pingtung, Taiwan
来源
Chemical Engineering Journal | 2022年 / 428卷
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