Dipole modification of the surface electronic structure of III-V semiconductors

被引:1
作者
Lebedev, Mikhail V. [1 ]
Savchenko, Grigory M. [1 ]
Averkiev, Nikita S. [1 ]
机构
[1] Ioffe Inst, Politekhn Skaya 26, St Petersburg 194021, Russia
关键词
X-RAY PHOTOELECTRON; GAAS(100); SULFUR; PASSIVATION; 1ST-PRINCIPLES; PHOTOCATHODES; ADSORPTION; GAAS; HOLE; ACID;
D O I
10.1016/j.ssc.2024.115484
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
A simple electrostatic model is proposed to account for the effect of dipoles associated with surface chemical bonds on the electronic structure of the semiconductor surface. In accordance with the model, the formation of the dipolar surface chemical bonds can change the width of the surface depletion layer leaving the surface band bending nearly intact. In addition, the surface dipoles can redistribute charge localized at surface states, which can modify surface recombination velocity of the semiconductor. The model can explain recently obtained experimental data on the electronic passivation of n-InP(100) surface with different sulfide solutions.
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页数:5
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