Bandgap variation in semiconductor thin films of the solid solution (CdTe)1-x(In2Te3)x deposited by RF sputtering

被引:0
作者
Melendez-Lira, Miguel [1 ]
Jimenez-Sandoval, Sergio [2 ]
Zapata-Torres, Martin [3 ]
Garcia-Sotelo, Alejandra [1 ]
Rodriguez, Eric Noe Hernandez [4 ]
Hernandez-Hernandez, Arturo [5 ]
机构
[1] Dept Fis, CINVESTAV, Apdo Postal 14-740, Mexico City 07360, Mexico
[2] Ctr Invest & Estudios Avanzados IPN, Unidad Queretaro, Libramiento Norponiente 2000, Queretaro 79230, Mexico
[3] Inst Politecn Nacl, CICATA Legaria, Mexico City, Mexico
[4] Univ Guanajuato, Mech Engn Dept, Salamanca, Guanajuato, Mexico
[5] Univ Autonoma Estado Hidalgo, Escuela Super Apan, Energet Syst & Adv Mat, Carretera Apan-Calpulalpan Km 8, Col Chimalpa, Apan 43920, Hidalgo, Mexico
关键词
semiconductor alloys; thin films; ordered vacancies semiconductors; electronic properties; photovoltaic materials; OPTICAL-CONSTANTS; PERFORMANCE; CRYSTAL; PHONON;
D O I
10.1088/2053-1591/ad3f78
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
(CdTe)1-x(In2Te3)x films, with 0.1 <= x <= 1, were deposited by radio frequency sputtering on glass substrates employing different targets, prepared for each composition. The x-ray diffractograms were consistent with substitutional In incorporation into the CdTe lattice up to a value of x = 0.2. For higher In contents, the films presented structural disorder without reaching full amorphous characteristics. For x = 1, corresponding to In2Te(3), preferential growth was observed. The bandgap of the solid solution varied between 1.46 and 1.2 eV, reaching a maximum of 1.58 eV for x = 0.3. For both end binary compounds the random incorporation of a third chemical element produced a significant broadening of the Raman modes consistent with a reduction of the lifetime of the optical phonons. The electrical resistivity was dependent on the Cd concentration reaching a minimum for x = 0.8.
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页数:10
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