The effect of cold plasma seed treatments on nodulation and plant growth in pea (Pisum sativum) and lentil (Lens culinaris)

被引：8

作者：

Abeysingha, Dhanuja N. ^{[1
]}

Dinesh, Shifa ^{[1
]}

Roopesh, M. S. ^{[1
]}

Warkentin, Thomas D. ^{[2
]}

Thilakarathna, Malinda S. ^{[1
]}

机构：

[1] Univ Alberta, Dept Agr Food & Nutr Sci, Edmonton, AB T6G 2P5, Canada

[2] Univ Saskatchewan, Crop Dev Ctr, Saskatoon, SK, Canada

来源：

PLASMA PROCESSES AND POLYMERS | 2024年 / 21卷 / 07期

关键词：

biological nitrogen fixation; cold plasma treatment; dielectric barrier discharge system; legumes; pin electrode reactor system; root nodulation; seed treatment; NITROGEN-FIXATION; GERMINATION; GENERATION; LEGUME;

D O I：

10.1002/ppap.202400015

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Cold plasma enhances various biological processes in plants. This study assessed the impact of cold plasma seed treatments on nodulation, root, and shoot growth in pea and lentil under controlled environmental conditions. Seeds were treated with cold plasma generated by a dielectric barrier discharge (DBD) and a pin electrode reactor (PER), with three different exposure durations (3, 6, and 12 min). At 4 weeks, notable enhancements were observed in nodule number and dry weight, root dry weight, length, volume, surface area, and shoot dry weight. The 3- and 6-min exposure using the DBD and the 3-min exposure using the PER system demonstrated the most significant increases or upward trends in these traits, highlighting the intricate nature of seed-plasma interactions.

引用

页数：12

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